Title:
SYSTEM FOR REFINING POLISHING PAD MATERIAL
Document Type and Number:
WIPO Patent Application WO2017010428
Kind Code:
A1
Abstract:
This system for refining a polishing pad material is equipped with a melting device for melting a solid material introduced thereto, and a homogenization device for homogenizing the material melted by the melting device, and is configured in a manner such that: the amount of material to be homogenized which the homogenization device can process is greater than the amount of material to be melted which the melting device can process; and the homogenization device stirs and homogenizes the material melted by the melting device.
Inventors:
KAWASE KATSUMI (JP)
SHIGETA YOSHITANE (JP)
YAMAKOSHI MASAHITO (JP)
SHIGETA YOSHITANE (JP)
YAMAKOSHI MASAHITO (JP)
Application Number:
PCT/JP2016/070295
Publication Date:
January 19, 2017
Filing Date:
July 08, 2016
Export Citation:
Assignee:
NITTA HAAS INC (JP)
International Classes:
B29B7/08; B24D11/00; B29B13/10; B29C39/24; B29C48/69
Foreign References:
| JP2009083398A | 2009-04-23 | |||
| JP2006525892A | 2006-11-16 | |||
| JP2014113648A | 2014-06-26 | |||
| JP2013218308A | 2013-10-24 | |||
| JP2015084122A | 2015-04-30 |
Attorney, Agent or Firm:
FUJIMOTO, Noboru (JP)
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