Title:
SYSTEM FOR SUPPLYING ULTRAPURE WATER AND METHOD OF WASHING SUBSTRATE, AND SYSTEM FOR PRODUCING ULTRAPURE WATER AND METHOD OF PRODUCING ULTRAPURE WATER
Document Type and Number:
WIPO Patent Application WO1993008931
Kind Code:
A3
Abstract:
An object of the present invention is to provide a method of washing a substrate, wherein even traces of impurities in minute and high-aspect-ratio trenches or holes can be washed and removed free from contamination by washing solution and a system and a method for producing ultrapure water, capable of producing ultrasuper pure water for use in the washing. The present invention is characterized in that, at the intermediate portions of a piping (7) for supplying a predetermined ultrapure water to a use point, there are provided: a first steam generating means (1) for heating a first ultrapure water for conversion into a first steam; a steam heating means (3) for further heating the first steam for conversion into a second steam higher in temperature than the first steam; and a cooling means (5) for cooling the second steam for conversion into a second ultrapure water.
Inventors:
OHMI TADAHIRO (JP)
Application Number:
PCT/JP1992/001450
Publication Date:
June 10, 1993
Filing Date:
November 09, 1992
Export Citation:
Assignee:
OHMI TADAHIRO (JP)
International Classes:
B08B3/02; C02F1/04; H01L21/00; H01L21/304; (IPC1-7): B08B/
Foreign References:
| JPS60190298A | 1985-09-27 | |||
| JPH02144195A | 1990-06-01 | |||
| JPH0285358A | 1990-03-26 | |||
| JPS63305917A | 1988-12-13 | |||
| JPH01150328A | 1989-06-13 | |||
| JPS6173333A | 1986-04-15 |
Other References:
See also references of EP 0615790A4
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