Title:
TARGET SUPPLY DEVICE, TARGET MATERIAL REFINING METHOD, TARGET MATERIAL REFINING PROGRAM, RECORDING MEDIUM HAVING TARGET MATERIAL REFINING PROGRAM RECORDED THEREIN, AND TARGET GENERATOR
Document Type and Number:
WIPO Patent Application WO/2016/001973
Kind Code:
A1
Abstract:
A target supply device (7A) may be provided with: a tank (84A) that contains a metallic target material (270); a nozzle (86A) having a nozzle hole (822A) through which the target material (270) is outputted from the tank (84A); a filter (831A) that is disposed in a communicating unit (860A) for guiding, to the nozzle hole (822A), the target material (270) in the tank (84A); a temperature variable device (78A) that changes the temperature of the target material (270) in the tank (84A); and a control unit (71A) that controls the temperature variable device (78A) such that oxygen in the target material (270) is deposited as a metal oxide by changing the temperature of the target material (270) in the tank (84A).
Inventors:
IWAMOTO FUMIO (JP)
SHIRAISHI YUTAKA (JP)
HORI TUKASA (JP)
WAKABAYASHI OSAMU (JP)
SHIRAISHI YUTAKA (JP)
HORI TUKASA (JP)
WAKABAYASHI OSAMU (JP)
Application Number:
PCT/JP2014/067382
Publication Date:
January 07, 2016
Filing Date:
June 30, 2014
Export Citation:
Assignee:
GIGAPHOTON INC (JP)
International Classes:
H05G2/00; H01L21/027
Domestic Patent References:
| WO2013029898A1 | 2013-03-07 |
Foreign References:
| JP2013201118A | 2013-10-03 | |||
| JP2013140771A | 2013-07-18 |
Attorney, Agent or Firm:
KINOSHITA & ASSOCIATES (JP)
Bottom intellectual property office of patent business corporation Tatsuyuki (JP)
Bottom intellectual property office of patent business corporation Tatsuyuki (JP)
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