Title:
TEMPERATURE MEASURING SYSTEM, HEATING DEVICE USING IT AND PRODUCTION METHOD FOR SEMICONDUCTOR WAFER, HEAT RAY INSULATING TRANSLUCENT MEMBER, VISIBLE LIGHT REFLECTION MEMBNER, EXPOSURE SYSTEM-USE REFLECTION MIRROR AND EXPOSURE SYSTEM, AND SEMICONDUCTOR DEVICE PRODUCED BY USING THEM AND VETICAL HEAT TREATING DEVICE
Document Type and Number:
WIPO Patent Application WO/2003/073055
Kind Code:
A1
Abstract:
A reflection member (28) is disposed to face the temperature measuring surface of an object of measurement (16) with a reflection space (35) formed between it and the temperature measuring surface. The reflection member (28) is constituted at a portion including a reflection surface (35) of a heat ray reflecting material for reflecting a heat ray in a specific wavelength band. Heat ray extracting passages (30a) are disposed to pass through a reflection member (28) with one end of each passage facing the temperature measuring surface. Heat ray extracted from the reflection space via the heat ray extracting passages is detected by a temperature detector (34). The above heat ray reflecting material consists of a laminate including a plurality of element reflection layers each consisting of a material translucent to a heat ray, wherein these element reflection layers consist of a combination of materials that provide mutually different refractive indexes for a heat ray in adjoining two layers with the difference in refractive index being at least 1.1. When the temperature of an object of measurement is measured using a radiation thermometer, the measurement is hardly susceptible to variations in emissivity of an object of measurement, and hence temperature can be measured accurately independent of the surface condition of the object and the configuration of a measuring system can be simplified.
Inventors:
ABE TAKAO (JP)
IMAI MASAYUKI (JP)
IMAI MASAYUKI (JP)
Application Number:
PCT/JP2003/001969
Publication Date:
September 04, 2003
Filing Date:
February 24, 2003
Export Citation:
Assignee:
SHINETSU HANDOTAI KK (JP)
ABE TAKAO (JP)
IMAI MASAYUKI (JP)
ABE TAKAO (JP)
IMAI MASAYUKI (JP)
International Classes:
E06B7/08; E06B9/386; G01J5/00; G01J5/08; G02B7/18; H01L21/00; (IPC1-7): G01J5/08; H01L21/26; H01K1/32; H01L21/027; G03F7/20; H01L21/324; G02B5/26; G02B5/28; H05B3/00
Domestic Patent References:
| WO1997032331A1 | 1997-09-04 |
Foreign References:
| US5154512A | 1992-10-13 | |||
| US5755511A | 1998-05-26 | |||
| US5814367A | 1998-09-29 | |||
| JPH0495338A | 1992-03-27 | |||
| JPS6414129A | 1989-01-18 | |||
| JPH03169954A | 1991-07-23 | |||
| JP2001242318A | 2001-09-07 | |||
| US5506389A | 1996-04-09 | |||
| EP1004550A1 | 2000-05-31 |
Other References:
MONTCALM C. ET AL.: "Multilayer reflective coatings for extremeultraviolet lithography", SPIE, vol. 3331, 1998, pages 42 - 51, XP000908927
Attorney, Agent or Firm:
Sugawara, Seirin (Sakae 2-chome Naka-ku Nagoya-shi, Aichi, JP)
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