TEXTURED-METASTABLE ALUMINUM ALLOY SPUTTER TARGETS

Title:

TEXTURED-METASTABLE ALUMINUM ALLOY SPUTTER TARGETS

Document Type and Number:

WIPO Patent Application WO2003066929

Kind Code:

A3

Abstract:

An aluminum alloy sputter target having a sputter target face for sputtering the sputter target. The sputter target face has a textured-metastable grain structure. The textured-metastable grain structure has a grain orientation ratio of at least 35 percent (200) orientation. The textured-metastable grain structure is stable during sputtering of the sputter target. The textured-metastable grain structure has a grain size of less than 5 µm.

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Inventors:

PERRY ANDREW C
GILMAN PAUL S
VAN DEN SYPE JAAK STEFAAN

Application Number:

PCT/US2002/033717

Publication Date:

October 23, 2003

Filing Date:

October 23, 2002

Export Citation:

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Assignee:

PRAXAIR TECHNOLOGY INC (US)

International Classes:

C22C21/12; C22F1/00; C22F1/04; C23C14/34; C22F1/057; (IPC1-7): C23C14/34; C22C21/00; C22C21/02; C22C21/04; C22C21/12; B08B7/00; B08B7/02; B44C1/22

Foreign References:

US20010054457A1	2001-12-27
US6171455B1	2001-01-09
US6126791A	2000-10-03
US5809393A	1998-09-15

Other References: