Title:
THERMAL DIFFUSION DEVICE AND ELECTRONIC APPARATUS
Document Type and Number:
WIPO Patent Application WO/2022/201918
Kind Code:
A1
Abstract:
A vapor chamber (1), which is one embodiment of this thermal diffusion device, comprises: a housing (10) having a first inner wall surface (11a) and second inner wall surface (12a) facing each other in the thickness direction (Z); a working medium (20) that is enclosed in the internal space of the housing (10); a sheet-like porous body (30) that is disposed between the first inner wall surface (11a) and second inner wall surface (12a) of the housing (10); and supporting bodies (41) and (42) that are disposed inside of the housing (10) along the extension direction of the porous body (30), and that support the first inner wall surface (11a) of the housing (10) and the porous body (30). The porous body (30) is disposed between the supporting bodies (41) and (42) and the second inner wall surface (12a). When the housing (10) is viewed in a plan view from the thickness direction (Z), the region where the first inner wall surface (11a) and the porous body (30) overlap is smaller than the region where the first inner wall surface (11a) and the porous body (30) do not overlap. A liquid passage (50) of the working medium (20) is formed in a space surrounded by the porous body (30) and the first inner wall surface (11a).
Inventors:
FUKUDA HIROSHI (JP)
Application Number:
PCT/JP2022/004717
Publication Date:
September 29, 2022
Filing Date:
February 07, 2022
Export Citation:
Assignee:
MURATA MANUFACTURING CO (JP)
International Classes:
F28D15/04; F28D15/02
Domestic Patent References:
| WO2019065864A1 | 2019-04-04 |
Foreign References:
| CN211234063U | 2020-08-11 | |||
| JP2018004108A | 2018-01-11 | |||
| JP3206206U | 2016-09-01 |
Attorney, Agent or Firm:
WISEPLUS IP FIRM (JP)
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