Title:
THERMAL DIFFUSION DEVICE AND ELECTRONIC APPARATUS
Document Type and Number:
WIPO Patent Application WO/2023/286577
Kind Code:
A1
Abstract:
A vapor chamber (thermal diffusion device) (1a) comprises: a liquid transport part (LP); an evaporation part (EP) which, in a planar view from the thickness direction (T), is connected to one end of the liquid transport part (LP); a housing (10) which has an internal space; a working medium (20) which is sealed in the internal space of the housing (10); a first capillary structure (30) which is provided in the internal space of the housing (10) and which overlaps with the liquid transport part (LP) in a planar view from the thickness direction (T); and a second capillary structure (40) which is provided in the internal space of the housing (10) and the which overlaps with the evaporation part (EP) in a planar view from the thickness direction (T). In a planar view from the thickness direction (T), the ratio of the area of the placement region (CR1) of the first capillary structure (30) to the area of the internal space of the housing (10) is not more than 50%. In a planar view from the thickness direction (T), the ratio of the area of the placement region (CR2) of the second capillary structure (40) overlapping the evaporation part (EP) to the area of the evaporation part (EP) is not less than 50%.
Inventors:
NUMOTO TATSUHIRO (JP)
FUKUDA HIROSHI (JP)
FUKUDA HIROSHI (JP)
Application Number:
PCT/JP2022/025486
Publication Date:
January 19, 2023
Filing Date:
June 27, 2022
Export Citation:
Assignee:
MURATA MANUFACTURING CO (JP)
International Classes:
F28D15/02; F28D15/04
Domestic Patent References:
| WO2020255513A1 | 2020-12-24 |
Foreign References:
| JP2003042675A | 2003-02-13 | |||
| JP2020076522A | 2020-05-21 |
Attorney, Agent or Firm:
WISEPLUS IP FIRM (JP)
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