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Title:
THERMO-SENSITIVE RECORDING TYPE LITHOGRAPHICAL BLOCK MATERIAL, METHOD OF MAKING UP LITHOGRAPHICAL BLOCK, AND LITHOGRAPHICAL BLOCK MADE UP BY THE MAKING UP METHOD
Document Type and Number:
WIPO Patent Application WO/2002/011996
Kind Code:
A1
Abstract:
A thermo-sensitive recording type lithographical block material having a high thermo-sensitiveness and capable of reproducing an image with high resolution by eliminating a development, and a lithographical block and a method of making up a lithographical block capable of providing a high quality printing with high resolution by using the thermo-sensitive recording type lithographical block material, wherein, by using a compound having a functional group obtained by protecting a carboxyl group by a vinyl ether, a hydrophilic surface caused by adding a heat at the time of making-up is changed to a lipophilic or a hydrophobic surface and vice versa so as to improve the problems.

Inventors:
YAMAMOTO HIDEYUKI (JP)
SATO KOJI (JP)
ISHIDOYA MASAHIRO (JP)
Application Number:
PCT/JP2001/006790
Publication Date:
February 14, 2002
Filing Date:
August 07, 2001
Export Citation:
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Assignee:
LABO CO LTD (JP)
NOF CORP (JP)
YAMAMOTO HIDEYUKI (JP)
SATO KOJI (JP)
ISHIDOYA MASAHIRO (JP)
International Classes:
B41C1/10; B41M5/36; B41N1/14; B41N3/03; (IPC1-7): B41N1/14
Foreign References:
JPH11157238A1999-06-15
JPH11123884A1999-05-11
JPH10264545A1998-10-06
US5910392A1999-06-08
Other References:
See also references of EP 1308312A4
Attorney, Agent or Firm:
Nakao, Shunsuke (Tokyo, Tokyo, JP)
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