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Title:
THIN ALLOY FILM EXHIBITING LOW THERMAL EXPANSION AND METHOD FOR PRODUCTION THEREOF
Document Type and Number:
WIPO Patent Application WO/2003/070996
Kind Code:
A1
Abstract:
A low thermal expansion thin alloy film which substantially has a chemical composition, in mass %: Ni: 30 to 34 %, Co: 2 to 6 %, Mn: 0.6 % or less, Al: 0.1 % or less, C: 0.02 % or less, Si: 0.3 % or less, P: 0.01 % or less, s: 0.005 % or less, N: 0.01 % or less, and balance: Fe, and exhibits an integration degree for (200)plane of 50 % or more and an integration degree for (220)plane of 20 % or less. The low thermal expansion thin alloy film exhibits not only high etching speed, but also excellent dimensional precision of etching, and thus can be advantageously used for a shadow mask of a cathode-ray tube.

Inventors:
KOBAYASHI AKIO (JP)
FUJITA KOICHIRO (JP)
YAMAUCHI KATSUHISA (JP)
ARIGA TAMAKO (JP)
TOMITA KUNIKAZU (JP)
MURATA SAIICHI (JP)
Application Number:
PCT/JP2003/001754
Publication Date:
August 28, 2003
Filing Date:
February 19, 2003
Export Citation:
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Assignee:
JFE STEEL CORP (JP)
KOBAYASHI AKIO (JP)
FUJITA KOICHIRO (JP)
YAMAUCHI KATSUHISA (JP)
ARIGA TAMAKO (JP)
TOMITA KUNIKAZU (JP)
MURATA SAIICHI (JP)
International Classes:
B21B3/02; B21B3/00; C21D9/46; C22C38/00; C22C38/02; C22C38/04; C22C38/06; C22C38/08; C22C38/10; H01J9/14; H01J29/07; (IPC1-7): C22C38/00; B21B3/00; C21D9/46; C22C38/10; H01J29/07
Foreign References:
US5396146A1995-03-07
JPH09157799A1997-06-17
JPH03158438A1991-07-08
Attorney, Agent or Firm:
Ochiai, Kenichiro c/o Intellectual Property Department JFE Steel Corporation 2-3 (Uchisaiwai-cho 2-chome Chiyoda-ku Tokyo, Tokyo, JP)
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