Title:
THIN FILM FOR ELECTRONIC DEVICE AND METHOD FOR MANUFACTURING SAME
Document Type and Number:
WIPO Patent Application WO/2021/145695
Kind Code:
A1
Abstract:
An embodiment of the present invention provides a thin film for an electronic device. The thin film comprises: a substrate; a buffer layer positioned on the substrate; a carbon nanotube-metal catalyst composite layer positioned on the buffer layer; and a metal oxide epitaxial layer positioned on the carbon nanotube-metal catalyst composite layer. In the thin film for an electronic device according to an embodiment of the present invention, threading dislocation and strain, which have conventionally occurred internally due to the difference in lattice constant between a substrate and a metal oxide epitaxial structure, are reduced, and thus the thin film is hardly affected by the difference in lattice constant, and therefore can be free from defects.
Inventors:
HA JUN SEOK (KR)
CHA AN NA (KR)
RHO HO KYUN (KR)
CHA AN NA (KR)
RHO HO KYUN (KR)
Application Number:
PCT/KR2021/000534
Publication Date:
July 22, 2021
Filing Date:
January 14, 2021
Export Citation:
Assignee:
UNIV NAT CHONNAM IND FOUND (KR)
International Classes:
H01L21/02
Foreign References:
| JP2015187072A | 2015-10-29 | |||
| KR20060092771A | 2006-08-23 | |||
| KR100774359B1 | 2007-11-08 | |||
| KR101210426B1 | 2012-12-11 | |||
| KR20100117075A | 2010-11-02 |
Attorney, Agent or Firm:
HAN, Sang Soo (KR)
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