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Title:
THIN FILM-FORMING MATERIAL, THIN FILM, AND THIN FILM PRODUCING METHOD
Document Type and Number:
WIPO Patent Application WO/2022/014344
Kind Code:
A1
Abstract:
Provided is a thin film-forming material containing a yttrium compound represented by general formula (1). (In the formula, R1 and R3 each independently represent an alkyl group having 1-6 carbon atoms or an alkoxyalkyl group having 2-6 carbon atoms, R2 represents a hydrogen atom or an alkyl group having 1-3 carbon atoms, R4 represents an alkanediyl group having 1-5 carbon atoms, R5 represents an alkyl group each having 1-3 carbon atoms, and R1, R2, R3, R4, and R5, which are each present in a number of more than one, may be the same or different within each other.)

Inventors:
HATASE MASAKO (JP)
MITSUI CHIAKI (JP)
OKADA NANA (JP)
YAMASHITA ATSUSHI (JP)
Application Number:
PCT/JP2021/024953
Publication Date:
January 20, 2022
Filing Date:
July 01, 2021
Export Citation:
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Assignee:
ADEKA CORP (JP)
International Classes:
C07C225/14; C07F5/00; C23C16/40
Foreign References:
JP2009161513A2009-07-23
JP2007302656A2007-11-22
JP2012153688A2012-08-16
JP2014166967A2014-09-11
Other References:
EDLEMAN NIKKI L., WANG ANCHUAN, BELOT JOHN A., METZ ANDREW W., BABCOCK JASON R., KAWAOKA AMBER M., NI JUN, METZ MATTHEW V., FLASCH: "Synthesis and Characterization of Volatile, Fluorine-Free β-Ketoiminate Lanthanide MOCVD Precursors and Their Implementation in Low-Temperature Growth of Epitaxial CeO 2 Buffer Layers for Superconducting Electronics", INORGANIC CHEMISTRY, AMERICAN CHEMICAL SOCIETY, EASTON , US, vol. 41, no. 20, 1 October 2002 (2002-10-01), Easton , US , pages 5005 - 5023, XP055899837, ISSN: 0020-1669, DOI: 10.1021/ic020299h
SHAKHOV FEDOR M.; ABYZOV ANDREY M.; TAKAI KAZUYUKI: "Boron doped diamond synthesized from detonation nanodiamond in a C-O-H fluid at high pressure and high temperature", JOURNAL OF SOLID STATE CHEMISTRY, ORLANDO, FL, US, vol. 256, 1 January 1900 (1900-01-01), US , pages 72 - 92, XP085229856, ISSN: 0022-4596, DOI: 10.1016/j.jssc.2017.08.009
BELOT J. A, WANG A, EDLEMAN N. L, BABCOCK J. R, METZ M. V, MARKS T. J, MARKWORTH P. R, CHANG R.: "Metal-Organic Chemical Vapor Deposition of Metal Oxides: from Precursor Synthesis to Thin Films", MATERIALS RESEARCH SOCIETY SYMPOSIA PROCEEDINGS, vol. 574, 30 November 1998 (1998-11-30), US , pages 37 - 43, XP009534146, ISSN: 0272-9172, ISBN: 978-1-60560-826-6, DOI: 10.1557/PROC-574-37
Attorney, Agent or Firm:
SOGA, Michiharu et al. (JP)
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