Title:
THIN FILM TRANSISTOR SUBSTRATE MANUFACTURING METHOD
Document Type and Number:
WIPO Patent Application WO/2015/159328
Kind Code:
A1
Abstract:
Disclosed is a method for manufacturing a TFT substrate that is provided with a thin film transistor having a CuMn alloy film, said method including a control step for controlling a contact resistance on a CuMn alloy film surface on the basis of a contact angle of the CuMn alloy film surface.
Inventors:
SAITOH TOHRU
Application Number:
PCT/JP2014/006377
Publication Date:
October 22, 2015
Filing Date:
December 22, 2014
Export Citation:
Assignee:
JOLED INC (JP)
International Classes:
H01L21/336; G09F9/30; H01L21/28; H01L29/786; H01L51/50; H05B33/10
Domestic Patent References:
WO2011089722A1 | 2011-07-28 |
Foreign References:
JP2002214177A | 2002-07-31 | |||
JP2004186275A | 2004-07-02 |
Attorney, Agent or Firm:
YOSHIKAWA, Shuichi et al. (JP)
Shuichi Yoshikawa (JP)
Shuichi Yoshikawa (JP)
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