Title:
THREE-DIMENSIONAL MEMORY STRUCTURE AND MANUFACTURING METHOD THEREOF
Document Type and Number:
WIPO Patent Application WO/2019/100836
Kind Code:
A1
Abstract:
A three-dimensional (3D) memory structure and a manufacturing method thereof are provided. The method includes the following steps. A 3D memory unit is formed on a first region of a substrate. A first insulation layer is formed on the first region and a second region of the substrate. A first planarization process is performed to the first insulation layer. The top surface of the first insulation layer on the first region and the top surface of the first insulation layer on the second region are coplanar after the first planarization process. A peripheral circuit is formed on the second region after the first planarization process. The influence of the process for forming the 3D memory unit on the peripheral circuit may be avoided. The manufacturing yield, the electrical performance, and the reliability of the 3D memory structure may be enhanced accordingly.
Inventors:
HUO ZONGLIANG (CN)
YU DEQIN (CN)
ZHOU WENBIN (CN)
GAO YONGHUI (CN)
YU DEQIN (CN)
ZHOU WENBIN (CN)
GAO YONGHUI (CN)
Application Number:
PCT/CN2018/106998
Publication Date:
May 31, 2019
Filing Date:
September 21, 2018
Export Citation:
Assignee:
YANGTZE MEMORY TECH CO LTD (CN)
International Classes:
H01L21/8242; H01L21/3105; H01L27/108; H01L27/11551; H01L27/11578
Foreign References:
| CN102800676A | 2012-11-28 | |||
| CN107946193A | 2018-04-20 |
Attorney, Agent or Firm:
NTD UNIVATION INTELLECTUAL PROPERTY AGENCY LTD. (CN)
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