Title:
TRANSPARENT ELECTRODE-EQUIPPED SUBSTRATE AND PRODUCTION METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2020/026606
Kind Code:
A1
Abstract:
Provided are: a transparent electrode-equipped substrate having, on a film base material having a transparent film substrate, a non-crystalline transparent foundation oxide layer and a non-crystalline transparent conductive oxide layer, wherein the transparent electrode-equipped substrate is capable of achieving low resistivity by having the transparent oxide layers being formed sequentially from the film base material side through sputtering such that the absolute value of a discharge voltage (VU) of a direct-current (DC) power supply when forming the transparent foundation oxide layer is 255-280 V, the ratio (VU/VC) between the discharge voltage (VU) of the DC power supply when forming the transparent foundation oxide layer and the discharge voltage VC of the DC power supply when forming the transparent conductive oxide layer is 0.86-0.98.
Inventors:
KUCHIYAMA TAKASHI (JP)
Application Number:
PCT/JP2019/023566
Publication Date:
February 06, 2020
Filing Date:
June 13, 2019
Export Citation:
Assignee:
KANEKA CORP (JP)
International Classes:
C23C14/34; B32B9/00; B32B9/04; C23C14/08; H01B5/14; H01B13/00
Domestic Patent References:
| WO2013111681A1 | 2013-08-01 | |||
| WO2015115237A1 | 2015-08-06 |
Foreign References:
| JP2005103768A | 2005-04-21 | |||
| JP2016031809A | 2016-03-07 | |||
| JP2017071850A | 2017-04-13 | |||
| JP2017008380A | 2017-01-12 |
Attorney, Agent or Firm:
NIIYAMA Yuichi et al. (JP)
Download PDF: