Title:
TRANSPARENT ELECTRODE SUBSTRATE, PRECURSOR TRANSPARENT ELECTRODE SUBSTRATE, AND METHOD FOR MANUFACTURING TRANSPARENT ELECTRODE SUBSTRATE
Document Type and Number:
WIPO Patent Application WO/2011/061982
Kind Code:
A1
Abstract:
Disclosed is a transparent electrode substrate which is provided with a transparent electrode film composed of a crystallized ITO film formed by crystallizing an ITO film by annealing. In the transparent electrode substrate, substances, such as volatile components in a color filter layer, are prevented from moving to the transparent electrode film. The transparent electrode substrate (1) is provided with: a transparent substrate (2); an amorphous transparent conductive film (5), which is disposed on the upper side of the transparent substrate (2); and the transparent electrode film (4), which is disposed on the upper side of the amorphous transparent conductive film (5), and which is composed of the crystallized ITO film. The transparent electrode film (4) can be obtained by annealing the ITO film, which has been formed by a sputtering method and the like. At the time of annealing, the amorphous transparent conductive film (5) maintains the amorphous state, and prevents the substances from moving to the transparent electrode film (4) from the color filter layer (3) on the lower side.
Inventors:
FUJITA TATSUYA
Application Number:
PCT/JP2010/064552
Publication Date:
May 26, 2011
Filing Date:
August 27, 2010
Export Citation:
Assignee:
SHARP KK (JP)
FUJITA TATSUYA
FUJITA TATSUYA
International Classes:
G02F1/1343; G02F1/1335; H01B5/14
Foreign References:
| JP2009252576A | 2009-10-29 | |||
| JPS61114844A | 1986-06-02 | |||
| JP2005249857A | 2005-09-15 | |||
| JP2010061942A | 2010-03-18 |
Attorney, Agent or Firm:
UENO, NOBORU (JP)
Ueno 登 (JP)
Ueno 登 (JP)
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