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Patent Searching and Data


Title:
TRAVEL PATTERN CREATION DEVICE AND OPERATION CONTROL METHOD USING SAME
Document Type and Number:
WIPO Patent Application WO/2021/171657
Kind Code:
A1
Abstract:
This travel pattern creation device is provided with: a stop avoidance zone position holding unit 1 for holding a coordinate system and position information on a stop avoidance zone of a vehicle 8, said coordinate system consisting of a position coordinate axis and a vehicle speed coordinate axis; a vehicle condition holding unit 2 for holding, among the specifications of the vehicle 8, acceleration information at least during each of acceleration, deceleration, and coasting periods of time; a brake pattern creation unit 3 for creating, using the position information and the acceleration information during the deceleration period of time, a brake pattern for stopping the vehicle 8 in a zone other than the stop avoidance zone; a coasting pattern creation unit 4 for creating, using the position information and the acceleration information during the coasting period of time, a coasting pattern for stopping the vehicle 8 in a zone other than the stop avoidance zone; a target region determination unit 5 for determining a target region 5 that is the region enclosed by the position coordinate axis, the brake pattern, and the coasting pattern; and a planned travel pattern creation unit 6 for creating a planned travel pattern that is a travel pattern avoiding the target region 5 and can be expressed in the coordinated system.

Inventors:
TSUTSUMI YUHI (JP)
MAEKAWA KEIJI (JP)
ODA ATSUSHI (JP)
KATSUTA KEIICHI (JP)
TSUJI MASAKI (JP)
Application Number:
PCT/JP2020/032934
Publication Date:
September 02, 2021
Filing Date:
August 31, 2020
Export Citation:
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Assignee:
HITACHI LTD (JP)
International Classes:
B60L7/00; B60L3/00; B60L15/20
Foreign References:
JP2014090556A2014-05-15
JP2013010477A2013-01-17
JP2006298069A2006-11-02
JP2016005294A2016-01-12
JP2014193098A2014-10-06
Other References:
See also references of EP 4112358A4
Attorney, Agent or Firm:
SUNNEXT INTERNATIONAL PATENT OFFICE (JP)
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