Title:
TREATMENT LIQUID FOR FORMING FILM HAVING CORROSION-RESISTANCE AND INSULATING PERFORMANCE
Document Type and Number:
WIPO Patent Application WO/2018/230313
Kind Code:
A1
Abstract:
Provided are a treatment liquid and a treatment method capable of improving both anti-rust performance and the insulating properties of a metal material.
The treatment liquid for forming a film having corrosion-resistance performance and insulating performance contains water, an organic metal compound, and a silicon compound having at least one selected from the group consisting of an alkoxysilyl group, an alkoxysilylene group, and a siloxane bond.
Inventors:
NOZAKI MASAFUMI (JP)
SHIMAHASHI KATSUMASA (JP)
KATO TAKASHI (JP)
SHIMAHASHI KATSUMASA (JP)
KATO TAKASHI (JP)
Application Number:
PCT/JP2018/020266
Publication Date:
December 20, 2018
Filing Date:
May 28, 2018
Export Citation:
Assignee:
OKUNO CHEM IND CO (JP)
International Classes:
C23C26/00; C09D5/08; C09D7/63; C09D183/04; C23C22/68; C23F11/173
Foreign References:
JP2009190369A | 2009-08-27 | |||
JP2014009371A | 2014-01-20 | |||
JP2013112837A | 2013-06-10 | |||
JP2003193263A | 2003-07-09 |
Attorney, Agent or Firm:
SAEGUSA & PARTNERS (JP)
Download PDF:
Previous Patent: SEMICONDUCTOR DEVICE
Next Patent: CONTROL DEVICE, CONTROL METHOD AND COMPUTER PROGRAM
Next Patent: CONTROL DEVICE, CONTROL METHOD AND COMPUTER PROGRAM