Title:
TRIARYLMETHANE-BASED COMPOUND
Document Type and Number:
WIPO Patent Application WO/2018/194002
Kind Code:
A1
Abstract:
Provided is a triarylmethane-based compound which has excellent light resistance, has satisfactory solubility in organic solvents and resins, and is suitable for use in dyes, inks, etc.
The triarylmethane-based compound is represented by general formula (I).
(In general formula (I), *, **, and *** indicate the bonding positions of ring A, ring B, and ring C, respectively, and ring A, ring B, and ring C are respectively rings having specific structures.)
Inventors:
KINOSHITA SATOSHI (JP)
SAWANO BUNJI (JP)
EZOE MASAYUKI (JP)
SAWANO BUNJI (JP)
EZOE MASAYUKI (JP)
Application Number:
PCT/JP2018/015628
Publication Date:
October 25, 2018
Filing Date:
April 14, 2018
Export Citation:
Assignee:
YAMAMOTO CHEMICALS INC (JP)
International Classes:
C09B11/02; C09B11/12; C09B11/26; C09B67/20; C09D11/00
Domestic Patent References:
| WO2015046285A1 | 2015-04-02 | |||
| WO2015045622A1 | 2015-04-02 | |||
| WO2015115282A1 | 2015-08-06 | |||
| WO1994000522A1 | 1994-01-06 |
Foreign References:
| JP2001288389A | 2001-10-16 | |||
| JP2013163804A | 2013-08-22 | |||
| JP2015069052A | 2015-04-13 | |||
| JP2015189874A | 2015-11-02 | |||
| JP2016040593A | 2016-03-24 | |||
| JP2016104860A | 2016-06-09 | |||
| JP2017008287A | 2017-01-12 | |||
| JP2002189116A | 2002-07-05 | |||
| JPH10235913A | 1998-09-08 |
Attorney, Agent or Firm:
MORIOKA Hiroshi (JP)
Download PDF: