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Title:
TRICHLOROSILANE PRODUCTION APPARATUS
Document Type and Number:
WIPO Patent Application WO/2008/053760
Kind Code:
A1
Abstract:
Disclosed is a trichlorosilane production apparatus comprising: a reaction vessel in which a supply gas comprising tetrachlorosilane and hydrogen is supplied to a reaction flow path provided therein to generate a reaction product gas comprising trichlorosilane and hydrogen chloride; a heating mechanism for heating the inside of the reaction vessel; a gas supply unit for supplying the supply gas into the reaction vessel; and a gas discharge unit for discharging the reaction product gas from the reaction vessel to the outside, wherein the reaction flow path comprises: a supply-side flow path which is connected to the gas supply unit at the center of the reaction vessel, runs within the reaction vessel with being held back, and causes the supply gas to flow toward the outside; a back flow path which is connected to the lowest end of the supply-side flow path and reaches the center of the reaction vessel; and a discharge-side flow path which is connected to the lowest end of the back flow path, is arranged adjacent to the center part of the supply-side flow path in the reaction vessel, and is also connected to the gas discharge unit.

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Inventors:
ISHII TOSHIYUKI (JP)
ITO HIDEO (JP)
SHIMIZU YUJI (JP)
Application Number:
PCT/JP2007/070725
Publication Date:
May 08, 2008
Filing Date:
October 24, 2007
Export Citation:
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Assignee:
MITSUBISHI MATERIALS CORP (JP)
ISHII TOSHIYUKI (JP)
ITO HIDEO (JP)
SHIMIZU YUJI (JP)
International Classes:
C01B33/107
Foreign References:
JPS62123011A1987-06-04
JPS5712826A1982-01-22
JPS6221706A1987-01-30
JPS57156318A1982-09-27
JPH08157073A1996-06-18
JP3781439B22006-05-31
Other References:
See also references of EP 2003092A4
Attorney, Agent or Firm:
SHIGA, Masatake et al. (Yaesu Chuo-k, Tokyo 53, JP)
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