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Patent Searching and Data


Title:
TRIFLUOROMETHYL ORGANOSILICON ALICYCLIC EPOXY MONOMER AND PREPARATION AND USE THEREOF
Document Type and Number:
WIPO Patent Application WO/2024/067720
Kind Code:
A1
Abstract:
The present invention relates to a compound of formula (I), wherein various variables n, m, R1, R2, R3 and R4 are as defined in the description. The compound of formula (I) can be subjected to photopolymerization, and has the advantages of good tensile property, excellent hydrophobic property, stain resistance, fingerprint resistance, chemical corrosion resistance, good heat resistance and the like after photocuring. The present invention further relates to preparation of the compound of formula (I), a photocurable composition comprising the compound of formula (I), and a photocurable material obtained by photocuring the photocurable composition.

Inventors:
SUN FANG (CN)
HU YUNLANG (CN)
Application Number:
PCT/CN2023/122140
Publication Date:
April 04, 2024
Filing Date:
September 27, 2023
Export Citation:
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Assignee:
HUBEI GURUN TECH CO LTD (CN)
International Classes:
C08G77/385; C07F7/08; C09D11/101; C09D11/102; C09D183/08; G03F7/004
Domestic Patent References:
WO2002092716A12002-11-21
Foreign References:
CN115521463A2022-12-27
CN1742048A2006-03-01
CN114854021A2022-08-05
EP0572179A21993-12-01
US5178959A1993-01-12
CN108530659A2018-09-14
CN112608412A2021-04-06
US6232362B12001-05-15
Other References:
MELISSA A. GRUNLAN: "Synthesis of α,ω-Bis Epoxy Oligo (1‘H,1‘H,2‘H,2‘H-Perfluoroalkyl Siloxane)s and Properties of Their Photo-Acid Cross-Linked Films", CHEMISTRY OF MATERIALS, AMERICAN CHEMICAL SOCIETY, US, vol. 16, no. 12, 1 June 2004 (2004-06-01), US , pages 2433 - 2441, XP093156191, ISSN: 0897-4756, DOI: 10.1021/cm034736h
Attorney, Agent or Firm:
ZHONGZI LAW OFFICE (CN)
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