Title:
TWO-FLUID DISCHARGE DEVICE, SUBSTRATE PROCESSING DEVICE, AND TWO-FLUID NOZZLE CONTROL METHOD
Document Type and Number:
WIPO Patent Application WO/2024/047938
Kind Code:
A1
Abstract:
Provided is a two-fluid discharge device comprising a two-fluid nozzle, a gas supply unit, a liquid supply unit, and a control unit. In the present invention, the two-fluid nozzle can discharge a mixed liquid obtained by mixing a liquid and a gas. In the two-fluid nozzle, the gas is supplied from the gas supply unit. Moreover, in the two-fluid nozzle, the liquid is supplied from the liquid supply unit. When the control unit controls the gas supply unit and the liquid supply unit to stop the discharge of the mixed liquid from the two-fluid nozzle, the control unit stops the supply of the liquid and then stops the supply of the gas.
Inventors:
KOMORI JUN (JP)
Application Number:
PCT/JP2023/016325
Publication Date:
March 07, 2024
Filing Date:
April 25, 2023
Export Citation:
Assignee:
SCREEN HOLDINGS CO LTD (JP)
International Classes:
B05B7/04; B05B12/02; H01L21/027; H01L21/304
Domestic Patent References:
| WO2007132609A1 | 2007-11-22 |
Foreign References:
| JPS59145065A | 1984-08-20 | |||
| JP2013026381A | 2013-02-04 | |||
| JP2021086994A | 2021-06-03 |
Attorney, Agent or Firm:
NAKAGAWA, Masahiro et al. (JP)
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