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Title:
ULTRA-COMPLIANT NANOIMPRINT LITHOGRAPHY TEMPLATE
Document Type and Number:
WIPO Patent Application WO/2011/094696
Kind Code:
A3
Abstract:
An ultra-compliant nanoimprint lithography template having a backing layer and a nanopatterned layer adhered to the backing layer. The nanopatterned layer includes nanoscale features formed by solidifying a polymerizable material in contact with a mold. The polymerizable material includes a fluoroelastomer and a photoinitiator. The backing layer has a higher elastic modulus than the nanopatterned layer. The ultra-compliant nanoimprint lithography template can be used to form multiple high fidelity imprints.

Inventors:
MILLER MICHAEL N (US)
LIU WEIJUN (US)
XU FRANK Y (US)
Application Number:
PCT/US2011/023193
Publication Date:
October 13, 2011
Filing Date:
January 31, 2011
Export Citation:
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Assignee:
MOLECULAR IMPRINTS INC (US)
International Classes:
G03F7/00
Domestic Patent References:
WO1997006012A11997-02-20
Foreign References:
US20080000373A12008-01-03
US20080055581A12008-03-06
US20050238967A12005-10-27
KR20070031858A2007-03-20
EP2221664A12010-08-25
Attorney, Agent or Firm:
FLANAGAN, Heather (Austin, Texas, US)
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