Title:
ULTRAVIOLET PHOTORESIST, AND ULTRAVIOLET PHOTORESIST PATTERNING METHOD AND USE
Document Type and Number:
WIPO Patent Application WO/2023/246243
Kind Code:
A1
Abstract:
An ultraviolet photoresist, and an ultraviolet photoresist patterning method and use. The ultraviolet photoresist comprises an organic solvent, a photosensitizer, and a zirconia nanocluster. The chemical formula of the zirconia nanocluster is ZrxOy(OH)zLm, wherein 2≤x≤20, 2≤y≤40, 0≤z≤40, 4≤m≤40, and L is a carboxyl-containing organic ligand. The photosensitizer has the structure as shown in (I), wherein R1 is as shown in (II), "*" represents a connection site, and R2 and R3 are each independently selected from -F, -Cl, -Br, or -I each time. The selection of the photosensitizer can greatly reduce the exposure dose and improve the photoetching speed.
Inventors:
XU HONG (CN)
HE XIANGMING (CN)
LIU TIANQI (CN)
HE XIANGMING (CN)
LIU TIANQI (CN)
Application Number:
PCT/CN2023/087668
Publication Date:
December 28, 2023
Filing Date:
April 11, 2023
Export Citation:
Assignee:
UNIV TSINGHUA (CN)
BEIJING VFORTUNE NEW ENERGY POWER TECH DEVELOPMENT CO LTD (CN)
BEIJING VFORTUNE NEW ENERGY POWER TECH DEVELOPMENT CO LTD (CN)
International Classes:
G03F7/004; G03F7/00
Domestic Patent References:
| WO2005083521A1 | 2005-09-09 |
Foreign References:
| CN111948904A | 2020-11-17 | |||
| JP2004309777A | 2004-11-04 | |||
| CN111766762A | 2020-10-13 | |||
| CN105384728A | 2016-03-09 | |||
| EP0369645A1 | 1990-05-23 | |||
| JP2004309778A | 2004-11-04 |
Attorney, Agent or Firm:
INTEBRIGHT LLP (CN)
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