Title:
V ALLOY TARGET
Document Type and Number:
WIPO Patent Application WO/2020/195565
Kind Code:
A1
Abstract:
Provided is a novel V alloy target in which, during machining of the target, unevenness in the target surface can be reduced, abnormal electrical discharge during film formation can be reduced, and a reduction in droplet adhesion on a material to be treated can also be achieved. This V alloy target is formed of V and Mo, has an average Vickers hardness value of 250-350 HV on the erosion surface thereof, and has a variation in Vickers hardness, measured at five measurement points, of no more than 20%, the Vickers hardness preferably being in the range of 270-340 HV and the V alloy target more preferably containing 10-50 at% of Mo and comprising V and unavoidable impurities as the remainder thereof.
Inventors:
SOGAME HIROAKI (JP)
FUKUOKA JUN (JP)
FUKUOKA JUN (JP)
Application Number:
PCT/JP2020/008600
Publication Date:
October 01, 2020
Filing Date:
March 02, 2020
Export Citation:
Assignee:
HITACHI METALS LTD (JP)
International Classes:
C23C14/24; B22F1/00; C22C1/04; C22C27/02; C22C27/04
Foreign References:
| JP2017088465A | 2017-05-25 | |||
| JP2009068047A | 2009-04-02 | |||
| JP2009208156A | 2009-09-17 | |||
| JP2015142944A | 2015-08-06 | |||
| CN104439247A | 2015-03-25 | |||
| JP2009068047A | 2009-04-02 |
Other References:
See also references of EP 3951002A4
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