Title:
VACUUM COATING DEVICE
Document Type and Number:
WIPO Patent Application WO/2023/245884
Kind Code:
A1
Abstract:
Disclosed in the present application is a vacuum coating device, comprising a heating apparatus, a carrier apparatus, a special gas spray apparatus, and a processing chamber; the heating apparatus is configured to heat the processing chamber so that the temperature of the processing chamber reaches a reaction temperature between a silicon wafer and a gas; the carrier apparatus is configured to load a silicon wafer; the processing chamber comprises a coating vacuum chamber I, a coating vacuum chamber II, and a carrier conversion vacuum chamber; the carrier conversion vacuum chamber is connected between the coating vacuum chamber I and the coating vacuum chamber II, and the carrier conversion vacuum chamber is used to switch a coating surface of a silicon wafer; and the vacuum chambers of the processing chamber are connected by means of a valve chamber.
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Inventors:
DAI JIA (CN)
ZHU HENAN (CN)
DONG XUEDI (CN)
ZHANG WU (CN)
LIN JIAJI (CN)
ZHU HENAN (CN)
DONG XUEDI (CN)
ZHANG WU (CN)
LIN JIAJI (CN)
Application Number:
PCT/CN2022/118600
Publication Date:
December 28, 2023
Filing Date:
September 14, 2022
Export Citation:
Assignee:
LAPLACE WUXI SEMICONDUCTOR TECH CO LTD (CN)
International Classes:
C23C14/22; C23C14/50
Domestic Patent References:
| WO2022027994A1 | 2022-02-10 |
Foreign References:
| CN208917304U | 2019-05-31 | |||
| CN208917302U | 2019-05-31 | |||
| CN101713063A | 2010-05-26 |
Attorney, Agent or Firm:
BEYOND ATTORNEYS AT LAW (CN)
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