Title:
VACUUM PROCESSING DEVICE
Document Type and Number:
WIPO Patent Application WO/2016/121075
Kind Code:
A1
Abstract:
The present invention provides a vacuum processing device provided with a gas supply means having a hard interlock for a pair of gas valves. The present invention is a vacuum processing device provided with a gas supply unit for supplying a gas for carrying out vacuum processing to a processing chamber, wherein the vacuum processing is carried out, using normally closed air driven valves and is characterized in that: the gas supply unit has an interlock function for one of the pair of air driven valves being closed when the other of the pair of valves is open, and is provided with an air circuit for controlling air for driving the air driven valves; and the air circuit is constituted using a solenoid valve having solenoid coils corresponding to each of the pair of air driven valves.
Inventors:
OGAWA YOSHIFUMI (JP)
KADOTANI MASANORI (JP)
ISOZAKI MASAKAZU (JP)
NUNOMURA NOBUHIDE (JP)
KADOTANI MASANORI (JP)
ISOZAKI MASAKAZU (JP)
NUNOMURA NOBUHIDE (JP)
Application Number:
PCT/JP2015/052609
Publication Date:
August 04, 2016
Filing Date:
January 30, 2015
Export Citation:
Assignee:
HITACHI HIGH TECH CORP (JP)
International Classes:
B01J3/02; C23C16/455; C23F4/00; F15B11/06; F16K51/02; H01L21/3065
Foreign References:
| JP2001085342A | 2001-03-30 | |||
| JP2000306884A | 2000-11-02 | |||
| JPH057763A | 1993-01-19 | |||
| JP2001319882A | 2001-11-16 | |||
| US20030212507A1 | 2003-11-13 |
Attorney, Agent or Firm:
INOUE Manabu et al. (JP)
Manabu Inoue (JP)
Manabu Inoue (JP)
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