VALVE DEVICE

WIPO Patent Application WO/2005/066528

A1

Flow rate characteristics are improved to increase the flow rate of a gas, and gas stagnation in a valve chamber is restricted to enhance gas replacement characteristics including vacuum discharge performance and purging performance. A first flow path (7), a valve chamber (9) of a shutoff valve (8), and a second flow path (10) are formed in that order in a housing (2). A diaphragm (13) is provided so as to sealingly cover the valve chamber (9). The inner end of the first flow path (7) is opened in a valve chamber inner surface to which an intermediate section of the diaphragm (13) faces, and a valve seat (15) is formed around the opening. The valve seat (15) is made to be in contact with and separated from the diaphragm (13) to open and close the shutoff valve (8). A groove (18) is formed in the valve chamber inner surface, around the valve seat (15). A groove opening (19) communicating with the second flow path (10) is formed in the groove (18), and the groove opening (19) has an opening area larger than the area of a circle with a groove width (w) as the diameter. The second flow path (10) is communicated with the valve chamber (9) through the groove opening (19) and the groove (18) in that order.

MIYAZAKI KOJI (JP)
KAMINAGA KOUICHI (JP)
SAJI KOUICHI (JP)

PCT/JP2004/018644

July 21, 2005

December 14, 2004

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NERIKI VALVE CO LTD (JP)
MIYAZAKI KOJI (JP)
KAMINAGA KOUICHI (JP)
SAJI KOUICHI (JP)

F17C13/04; F16K1/06; F16K7/16; F16K27/02; (IPC1-7): F16K7/16

JP2002147623A	2002-05-22
JPH06341560A	1994-12-13
JPH1026240A	1998-01-27
JP2775496B2	1998-07-16

Suzue, Shoji (2-4 Komatsubara-cho, Kita-ku, Osaka-sh, Osaka 18, JP)

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