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Patent Searching and Data


Title:
VAPOR CHAMBER AND ELECTRONIC DEVICE
Document Type and Number:
WIPO Patent Application WO/2021/244448
Kind Code:
A1
Abstract:
Disclosed in embodiments of the present application are a vapor chamber and an electronic device. The vapor chamber comprises: a first cover plate close to a heat source and a second cover plate away from the heat source; the first cover plate and the second cover plate enclose a cavity; the cavity is at least divided into a first cavity and a second cavity, wherein the cross-sectional dimension of the first cavity is different from that of the second cavity; a first wick is provided in the first cavity; the first wick has one end connected to the first cover plate and the other end connected to the second cover plate; and a second wick is provided in the second cavity and is parallel to the first cover plate, wherein the first wick is connected to the second wick, and the first cavity is communicated with the second cavity. The vapor chamber combining a serial structure and a parallel structure can support use for an irregular structure, so that the internal structure of the wick can be flexibly adjusted according to the shape of a product heat source, and the temperature uniformity of the vapor chamber is improved.

Inventors:
YANG JIE (CN)
SHI JIAN (CN)
SUN YONGFU (CN)
SUN ZHEN (CN)
Application Number:
PCT/CN2021/096985
Publication Date:
December 09, 2021
Filing Date:
May 28, 2021
Export Citation:
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Assignee:
HUAWEI TECH CO LTD (CN)
International Classes:
F28D15/04; H05K7/20
Foreign References:
CN209281334U2019-08-20
CN108801015A2018-11-13
CN106376214A2017-02-01
CN111194160A2020-05-22
JPH10209356A1998-08-07
CN202010485885A2020-06-01
Attorney, Agent or Firm:
BEIJING ZBSD PATENT&TRADEMARK AGENT LTD. (CN)
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