Title:
VAPOR DEPOSITION DEVICE, VAPOR DEPOSITION METHOD, AND ORGANIC EL ELEMENT
Document Type and Number:
WIPO Patent Application WO/2016/017538
Kind Code:
A1
Abstract:
This vapor deposition device (11) is provided with: first and second vapor deposition sources (12) and (13); a common piping (27) that is connected to the first and second vapor deposition sources (12) and (13); a vapor deposition particle emission source (29) that is connected to the common piping (27) and emits vapor deposition particles from the first and second vapor deposition sources (12) and (13); an exhaust valve (32) that is connected to the vapor deposition particle emission source (29); and an exhaust pump (34) that is connected to the exhaust valve (32).
Inventors:
OCHI TAKASHI
KAWATO SHINICHI
KOBAYASHI YUHKI
MATSUNAGA KAZUKI
KIKUCHI KATSUHIRO
ICHIHARA MASAHIRO
MATSUMOTO EIICHI
KAWATO SHINICHI
KOBAYASHI YUHKI
MATSUNAGA KAZUKI
KIKUCHI KATSUHIRO
ICHIHARA MASAHIRO
MATSUMOTO EIICHI
Application Number:
PCT/JP2015/071084
Publication Date:
February 04, 2016
Filing Date:
July 24, 2015
Export Citation:
Assignee:
SHARP KK (JP)
International Classes:
C23C14/24; H01L51/50; H05B33/10
Foreign References:
| JP2010159448A | 2010-07-22 | |||
| JP2005281808A | 2005-10-13 | |||
| JP2006009107A | 2006-01-12 | |||
| JPH05247631A | 1993-09-24 |
Attorney, Agent or Firm:
IKEUCHI SATO & PARTNER PATENT ATTORNEYS (JP)
Patent business corporation Ikeuchi and Sato and partners (JP)
Patent business corporation Ikeuchi and Sato and partners (JP)
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