Title:
VAPOR DEPOSITION MASK INTERMEDIATE, VAPOR DEPOSITION MASK, AND METHOD FOR MANUFACTURING VAPOR DEPOSITION MASK
Document Type and Number:
WIPO Patent Application WO/2021/045137
Kind Code:
A1
Abstract:
A vapor deposition mask intermediate is provided with a belt-like part and a frame-like part surrounding the belt-like part. The belt-like part is provided with a mask part having a plurality of mask pores formed therein and a peripheral part surrounding the mask part. Each of the peripheral part and the frame-like part has a first thickness. The edge of the belt-like part includes a first edge and a second edge. The first edge includes a portion which faces the mask part in the direction of the width of the belt-like part. Between the first edge and the frame-like part, a separation part for separating the first edge from the frame-like part is positioned. Between the second edge and the frame-like part, a linear half-etching part having a second thickness that is thinner than the first thickness is positioned.
Inventors:
MATSUGUMA KAORI (JP)
AIKAWA KENICHIRO (JP)
AIKAWA KENICHIRO (JP)
Application Number:
PCT/JP2020/033374
Publication Date:
March 11, 2021
Filing Date:
September 03, 2020
Export Citation:
Assignee:
TOPPAN PRINTING CO LTD (JP)
International Classes:
C23C14/04; H05B33/10
Domestic Patent References:
| WO2018066325A1 | 2018-04-12 | |||
| WO2018196365A1 | 2018-11-01 |
Foreign References:
| JP2005005071A | 2005-01-06 | |||
| JP2019523340A | 2019-08-22 |
Attorney, Agent or Firm:
ONDA Makoto et al. (JP)
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