Title:
VAPORIZATION DEVICE, GAS SUPPLY DEVICE AND CONTROL METHOD FOR GAS SUPPLY DEVICE
Document Type and Number:
WIPO Patent Application WO/2022/075111
Kind Code:
A1
Abstract:
Provided are a vaporization device, a gas supply device, and a control method for the gas supply device which can supply gas at a high flow rate with a compact device. This vaporization device comprises a heat exchange unit which heats a liquid starting material, and a vaporization unit which vaporizes the heated liquid starting material to produce a starting material gas, wherein the heat exchange unit has a branching part which is supplied with and branches the liquid starting material, and thin tubes which are connected to the branching part.
Inventors:
AYAI YUTA (JP)
HIRAO KEIJI (JP)
HIRAO KEIJI (JP)
Application Number:
PCT/JP2021/035455
Publication Date:
April 14, 2022
Filing Date:
September 27, 2021
Export Citation:
Assignee:
TOKYO ELECTRON LTD (JP)
FUJIKIN KK (JP)
FUJIKIN KK (JP)
International Classes:
B01J4/00; B01J7/00; F17C7/04; H01L21/205; H01L21/31
Domestic Patent References:
| WO2013146680A1 | 2013-10-03 | |||
| WO2016174832A1 | 2016-11-03 |
Foreign References:
| JP2006202965A | 2006-08-03 | |||
| JP2007046084A | 2007-02-22 | |||
| JPH02112327U | 1990-09-07 | |||
| JP2007518267A | 2007-07-05 |
Attorney, Agent or Firm:
ITOH, Tadashige et al. (JP)
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