VAPORIZATION SUPPLY APPARATUS

WIPO Patent Application WO/2016/174832

A1

[Problem] To provide a vaporization supply apparatus capable of preventing a problem that a gas flow path extending from within a vaporizer to a flow rate control device is filled with a liquid. [Solution] This vaporization supply apparatus is provided with: a vaporizer 2 that heats and vaporizes a liquid L; a flow rate control device 3 that controls the flow rate of gas sent from the vaporizer; a first control valve 5 interposed in a path 4 for supplying the liquid to the vaporizer 2; a pressure detector 6 for detecting the pressure of gas that is vaporized by the vaporizer 2 and sent to the flow rate control device 3; a liquid detection unit 7A that measures a parameter of a volume of liquid exceeding a predetermined volume in the vaporizer 2; and a control device 8 that controls the first control valve 5 so as to supply a predetermined volume of the liquid L to the vaporizer 2 on the basis of a pressure value detected by the pressure detector 6, and controls so as to close the first valve 5 when the liquid detection unit 7A detects the liquid.

HIDAKA ATSUSHI (JP)
NAGASE MASAAKI (JP)
HIRATA KAORU (JP)
SUGITA KATSUYUKI (JP)
NAKATANI TAKATOSHI (JP)
YAMASHITA SATORU (JP)
NISHINO KOUJI (JP)
IKEDA NOBUKAZU (JP)
HIRAO KEIJI (JP)

PCT/JP2016/001967

November 03, 2016

April 11, 2016

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FUJIKIN KK (JP)

C23C16/448; B01J4/00; B01J7/02; C23C16/52; H01L21/31

JP2009252760A	2009-10-29
JP2000133644A	2000-05-12
JP2005217089A	2005-08-11
JP2010173660A	2010-08-12
JPH02261529A	1990-10-24
JP2010180429A	2010-08-19

TANIDA, Ryuichi et al. (JP)
Ryuichi Yata (JP)

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