Title:
VR EYE MASK AND MANUFACTURING METHOD FOR HOLOGRAPHIC DISPLAY ELEMENT
Document Type and Number:
WIPO Patent Application WO/2022/082905
Kind Code:
A1
Abstract:
A VR eye mask and a manufacturing method for a holographic display element. The method comprises the following steps: (S10) providing a holographic material (10); (S20) making a reference beam (20) incident on a first surface (11) of the holographic material (10) at a preset angle of incidence with respect to the holographic material (10); and (S30) emitting at least two concentric beams (30) from different positions and making said beams incident on a second surface (12) of the holographic material (10), when the concentric beams (30) are incident on the second surface (12) of the holographic material (10), the both and the reference beam (20) are subjected to interference exposure to form a holographic grating. When image source light (100) is incident on the second surface (12) of the holographic display element, because the holographic grating has a memory function for light angles of the concentric beams (30), the image source light (100) can be reflected outward in the opposite direction of the concentric beams (30) incident on the second surface (12) of the holographic material (10) to form reflected light (40). That is, the image source can be reflected to at least two different positions, i.e., the image source can be generated at different positions, which is equivalent to off-axis exit pupil expansion. The visual range of human eyes is greatly increased, and the product performance is improved.
Inventors:
ZHANG BIMING (CN)
Application Number:
PCT/CN2020/128619
Publication Date:
April 28, 2022
Filing Date:
November 13, 2020
Export Citation:
Assignee:
AAC OPTICS SHENZHEN CO LTD (CN)
International Classes:
G02B27/01; G03H1/12; G02B30/00
Foreign References:
| KR20190101201A | 2019-08-30 | |||
| CN103698836A | 2014-04-02 | |||
| CN104423042A | 2015-03-18 | |||
| CN105137598A | 2015-12-09 | |||
| US20170185037A1 | 2017-06-29 |
Attorney, Agent or Firm:
ADVANCE CHINA IP LAW OFFICE (CN)
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