Title:
W-Ti SPUTTERING TARGET
Document Type and Number:
WIPO Patent Application WO/2020/095595
Kind Code:
A1
Abstract:
The W-Ti sputtering target according to the present invention is characterized by containing Ti within a range of 5-20 mass%, Fe within a range of 25-100 mass ppm, and Cr within a range of 5-35 mass ppm, the balance having a composition composed of W and unavoidable impurities.
Inventors:
KIUCHI KAHO (JP)
SAITO ATSUSHI (JP)
SAITO ATSUSHI (JP)
Application Number:
PCT/JP2019/039462
Publication Date:
May 14, 2020
Filing Date:
October 07, 2019
Export Citation:
Assignee:
MITSUBISHI MATERIALS CORP (JP)
International Classes:
C23C14/34; C22C27/04
Domestic Patent References:
| WO2016056441A1 | 2016-04-14 |
Foreign References:
| JP2012087335A | 2012-05-10 | |||
| JP2008218693A | 2008-09-18 | |||
| JPH05295531A | 1993-11-09 | |||
| JPH0551732A | 1993-03-02 |
Attorney, Agent or Firm:
MATSUNUMA Yasushi et al. (JP)
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