Title:
WAFER CASSETTE CLEANING APPARATUS AND CONTROL METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2023/011417
Kind Code:
A1
Abstract:
A wafer cassette cleaning apparatus and a control method therefor. The wafer cassette cleaning apparatus comprises a cavity, a rotating frame and a cleaning assembly, a cleaning chamber being defined in the cavity, the rotating frame being rotatably arranged in the cleaning chamber, the cleaning assembly having a cleaning area and being used to spray a cleaning liquid into the cleaning area, and the spray amount of the cleaning assembly in a first state being greater than the spray amount in a second state. The control method comprises the following steps: the rotating frame driving a wafer cassette so as to cause the wafer cassette to rotate relative to the cleaning area, and determining whether the wafer cassette cleaning device satisfies a preset condition, the preset condition being that at least part of the wafer cassette is in the cleaning area; if so, the cleaning assembly switching to the first state, and if not, the cleaning assembly switching to the second state.
Inventors:
XU CHENGE (CN)
LI YINGHUI (CN)
LI YINGHUI (CN)
Application Number:
PCT/CN2022/109473
Publication Date:
February 09, 2023
Filing Date:
August 01, 2022
Export Citation:
Assignee:
XUZHOU XINJING SEMICONDUCTOR TECH CO LTD (CN)
International Classes:
B08B9/28; B08B13/00
Foreign References:
| CN113843235A | 2021-12-28 | |||
| CN111842380A | 2020-10-30 | |||
| CN111568328A | 2020-08-25 | |||
| CN102357479A | 2012-02-22 | |||
| JP2002066427A | 2002-03-05 |
Attorney, Agent or Firm:
TSINGYIHUA INTELLECTUAL PROPERTY LLC (CN)
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