WAFER HAVING AUXILIARY PATTERN FOR LIGHT-EMITTING ELEMENT ALIGNMENT AND UNIT PIXEL MANUFACTURING METHOD USING SAME

Title:

WAFER HAVING AUXILIARY PATTERN FOR LIGHT-EMITTING ELEMENT ALIGNMENT AND UNIT PIXEL MANUFACTURING METHOD USING SAME

Document Type and Number:

WIPO Patent Application WO/2022/075799

Kind Code:

A1

Abstract:

A wafer for manufacturing unit pixels is provided. The wafer comprises: a transparent substrate; and a light shielding layer disposed on the transparent substrate, wherein: the light shielding layer includes a plurality of unit pixel regions and at least one observation region; the plurality of unit pixel regions each include a light-emitting element mounting area for mounting a light-emitting element therein; and the observation region includes a light-emitting element mounting area for mounting a light-emitting element therein and an auxiliary pattern disposed around the light-emitting element mounting area.

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Inventors:

CHA NAMGOO (KR)
PARK SEONGCHAN (KR)
LIM JAE HEE (KR)

Application Number:

PCT/KR2021/013863

Publication Date:

April 14, 2022

Filing Date:

October 08, 2021

Export Citation:

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Assignee:

SEOUL VIOSYS CO LTD (KR)

International Classes:

H01L27/15; H01L25/075; H01L33/00; H01L33/44; H01L33/48

Foreign References:

KR20180022683A	2018-03-06
KR20180097979A	2018-09-03
KR20190053500A	2019-05-20
KR20190026617A	2019-03-13
US20190157519A1	2019-05-23

Attorney, Agent or Firm:

AIP PATENT & LAW FIRM (KR)

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