WAFER STORAGE CONTAINER CLEANING APPARATUS, AND WAFER STORAGE CONTAINER CLEANING METHOD

WIPO Patent Application WO/2022/176284

A1

A wafer storage container cleaning apparatus (1) is provided with: a cleaning vessel (31) which can accommodate a housing fixture (3) in which a wafer storage container (2) having a container main body (11) and a lid body (12) is housed; a liquid supply nozzle (32A to 32H) for supplying a cleaning solution or the like into the cleaning vessel (31); and a liquid discharge nozzle (34) for discharging a waste solution to the outside of the cleaning vessel (31). The container main body (11) has a rear wall (11A) opposed to a container opening (11B). The liquid supply nozzle (32A to 32H) is arranged in such a manner that each liquid supply opening (32AA to 32HA) for ejecting the cleaning solution or the like therethrough can face the inside of the rear wall (11A) in such a housed state that the container main body (11) is installed in the housing fixture (3) and is housed in the cleaning vessel (31) while the container opening (11B) faces downward, and the liquid discharge nozzle (34) is arranged in such a manner that a discharge opening (34A) through which the waste solution is sucked can face the center of the inside of the rear wall (11A) in the above-mentioned housed state.

WO/2013/033995	CLEANING DEVICE FOR REFLECTIVE SURFACE OF DISC LIGHT-CONDENSER
JP2936448	[Title of Invention] Method for cleaning steel plate

IWASAKI FUMITOSHI (JP)
WAKASUGI KATSURO (JP)

PCT/JP2021/041151

August 25, 2022

November 09, 2021

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SUMCO CORP (JP)

B08B3/02; B08B3/04; H01L21/304

JP2001000929A	2001-01-09
JP2004167337A	2004-06-17

KINOSHITA & ASSOCIATES (JP)

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