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Patent Searching and Data


Title:
WASTE GAS-TREATING SCRUBBER FORMED OF COMBINATION OF GAS-LIQUID CONTACT MEANS HAVING MULTIPLE FUNCTIONS SO AS TO BE APPROPRIATE FOR TREATING ACCORDING TO WASTE GAS PROPERTIES
Document Type and Number:
WIPO Patent Application WO/2016/208978
Kind Code:
A1
Abstract:
The present invention relates to a scrubber treating exhaust gas by means of a multilayer gas-liquid contact means assembly formed by combining a plurality of unit gas-liquid contact means having different gas-liquid contact functions so as to be appropriate for treating perfluorocarbon (PFC) exhaust gas according to the properties and concentration thereof, the PFC exhaust gas being emitted from a semiconductor manufacturing process. The scrubber is a wet scrubber absorbing and purifying exhaust gas by having a cleaning solution come into contact with PFC exhaust gas, wherein the gas-liquid contact means installed inside the scrubber is formed of a multilayer structure formed by combining a plurality of gas-liquid contact means unit bodies having different gas-liquid contact functions.

Inventors:
SEO ICK HWAN (KR)
PARK DAE YEON (KR)
PARK SEUNG CHUL (KR)
KIM JI YOUNG (KR)
Application Number:
PCT/KR2016/006662
Publication Date:
December 29, 2016
Filing Date:
June 23, 2016
Export Citation:
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Assignee:
HYOJIN IDS CO LTD (KR)
SAMSUNG ENG CO LTD (KR)
International Classes:
H01L21/02; B01D47/06; B01D53/78; H01L21/60; H01L21/67
Foreign References:
KR101478973B12015-01-05
JP2006272034A2006-10-12
KR101320638B12013-10-23
KR101513682B12015-04-21
KR100816822B12008-03-31
Attorney, Agent or Firm:
MIN, MAN HO (KR)
민만호 (KR)
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