WATER TREATMENT DEVICE USING UNDERWATER PLASMA DISCHARGE

WIPO Patent Application WO/2021/091037

A1

The present invention provides a water treatment device using an underwater plasma discharge, the water treatment device comprising: an electrode structure installed in a storage space in which water is stored or in a flow space in which water flows so as to cause an underwater plasma discharge; and a gas supply module for supplying a gas to the storage space or the flow space such that bubbles are supplied underwater, as a discharge gas, to the electrode structure. The electrode structure comprises: a first electrode; a second electrode disposed opposite the first electrode; and a dielectric member disposed in a space between the first electrode and the second electrode. The first electrode has a first seating hole formed therein such that a part of the dielectric member is inserted and seated therein. The first seating hole has a bubble inflow passage disposed therein such that same is not covered by the dielectric member when the dielectric member is seated therein. Accordingly, bubbles supplied by the gas supply module through the bubble inflow passage flow into the space between the first electrode and the second electrode, thereby causing an underwater plasma discharge in the space between the first electrode and the second electrode.

KANG KYOUNG DOO (KR)
KO KYOUNG JUN (KR)
KIM MIN JAE (KR)
LEE SEON MI (KR)

PCT/KR2020/007131

May 14, 2021

June 02, 2020

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PURE PLATECH CO LTD (KR)

C02F1/46; C02F1/461; C02F1/467; H05H1/24

KR20110056345A	2011-05-27
KR20090097340A	2009-09-16
KR20150068579A	2015-06-22
JP2017016814A	2017-01-19
KR102112294B1	2020-05-18

JEON, Yong Joon (KR)

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