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Title:
WAVEFRONT MEASUREMENT DEVICE AND WAVEFRONT MEASUREMENT METHOD
Document Type and Number:
WIPO Patent Application WO/2022/123710
Kind Code:
A1
Abstract:
This wavefront measurement device comprises: a first lens array that divides a light flux that is emitted from an optical system to be inspected, forms an image, and then propagates while spreading, and collects the divided light fluxes; a detection unit that is disposed at a location in which a condensing spot of the plurality of light fluxes radiating from the first lens array is formed, and detects the condensing spot; and a control unit that calculates a transmitted wavefront of the optical system to be inspected from a location of the center of gravity of the condensing spot when the first lens array is disposed at a location conjugate with the optical system to be inspected, that is, a location in which an image of the optical system to be inspected is transferred.

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Inventors:
FUJIE AKIHIRO (JP)
MIWA YOSHICHIKA (JP)
ENDO TAKAO (JP)
ANDO TOSHIYUKI (JP)
Application Number:
PCT/JP2020/045966
Publication Date:
June 16, 2022
Filing Date:
December 10, 2020
Export Citation:
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Assignee:
MITSUBISHI ELECTRIC CORP (JP)
International Classes:
G01M11/02
Foreign References:
JP2013195410A2013-09-30
JP2020071212A2020-05-07
US20200041351A12020-02-06
JP2015055544A2015-03-23
Other References:
See also references of EP 4242621A4
Attorney, Agent or Firm:
MURAKAMI, Kanako et al. (JP)
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