Title:
X-RAY GENERATION TARGET, EXAMINATION SYSTEM, CONTROL DEVICE, CONTROL METHOD, AND CONTROL PROGRAM
Document Type and Number:
WIPO Patent Application WO/2015/178228
Kind Code:
A1
Abstract:
An X-ray generation target (112) is provided with a substrate in one embodiment. Also, in the one embodiment, the X-ray generation target is provided with a plurality of first X-ray nano-targets (112f) that are disposed on the substrate, and that have a first size. Additionally, in the one embodiment, the X-ray generation target is provided with second X-ray nano-targets (112g) that are disposed on the substrate at positions specified by the first X-ray nano-targets (112f) and that have a second size, which is smaller than the first size.
Inventors:
UMEHARA YASUTOSHI (JP)
NAMIOKA ICHIRO (JP)
KADOSAWA KATSUJI (JP)
NAMIOKA ICHIRO (JP)
KADOSAWA KATSUJI (JP)
Application Number:
PCT/JP2015/063366
Publication Date:
November 26, 2015
Filing Date:
May 08, 2015
Export Citation:
Assignee:
TOKYO ELECTRON LTD (JP)
International Classes:
H01J35/08; G01N23/04; H05G1/00
Foreign References:
| JPH06188092A | 1994-07-08 | |||
| JP2012054045A | 2012-03-15 | |||
| JP2014067513A | 2014-04-17 | |||
| JP2009205992A | 2009-09-10 | |||
| JP2012088170A | 2012-05-10 | |||
| JP2015079615A | 2015-04-23 |
Attorney, Agent or Firm:
SAKAI, HIROAKI (JP)
Hiroaki Sakai (JP)
Hiroaki Sakai (JP)
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