Title:
ZN-BASED ORGANICALLY-COORDINATED NANOPARTICLES, PHOTORESIST COMPOSITION, PREPARATION METHOD THEREFOR, AND USE THEREOF
Document Type and Number:
WIPO Patent Application WO/2024/046107
Kind Code:
A1
Abstract:
The present invention relates to Zn-based organically-coordinated nanoparticles, a photoresist composition, a preparation method therefor, and the use thereof. The nanoparticles have a metal-organic one-dimensional repeatedly-arranged chain structure, the structural general formula being [ZnX2(CH3COO)Y]n, X being selected from benzoate or m-methylbenzoate, Y being selected from organic amine ligands, n being the degree of polymerization, and n being greater than or equal to 1. The Zn-based organically-coordinated nanoparticles can be used for forming a photoresist composition, which can be used for middle-ultraviolet, electron beam and extreme-ultraviolet lithography so as to obtain high-quality exposure patterns. Therefore, the Zn-based organically-coordinated nanoparticles of the present invention have remarkable potential and value in use.
Inventors:
XU HONG (CN)
HE XIANGMING (CN)
TAO PEIPEI (CN)
HE XIANGMING (CN)
TAO PEIPEI (CN)
Application Number:
PCT/CN2023/112964
Publication Date:
March 07, 2024
Filing Date:
August 14, 2023
Export Citation:
Assignee:
UNIV TSINGHUA (CN)
BEIJING VFORTUNE NEW ENERGY POWER TECH DEVELOPMENT CO LTD (CN)
BEIJING VFORTUNE NEW ENERGY POWER TECH DEVELOPMENT CO LTD (CN)
International Classes:
C08G83/00; G03F1/76; G03F7/00; G03F7/004; G03F7/20
Foreign References:
| CN114675488A | 2022-06-28 | |||
| CN112462572A | 2021-03-09 | |||
| CN112859515A | 2021-05-28 | |||
| CN104829487A | 2015-08-12 | |||
| US20210149299A1 | 2021-05-20 |
Attorney, Agent or Firm:
INTEBRIGHT LLP (CN)
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