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JP2011011327A |
To completely prevent a stainless steel top plate from being damaged with scratches, rust or the like generated as a result of interannual use when a sink cabinet, a cooking table, and a stove table having the stainless steel top plate m...
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JP2010274372A |
To provide a method for easily determining whether a grinding work is finished well.In a grinding brush 20, a main brush 41 and a check brush 42 the tip portion of which is recessed from the main brush 41 are provided, and a step 51 is f...
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JP2010274386A |
To provide a sliding material of Si-particle-containing Al-Si alloy, preventing generation of scuffing (in particular, at low temperature) on a sliding surface.The sliding surface contains at least 17-35 mass% of Si, and includes groove ...
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JP4594545B2 |
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JP4579382B2 |
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JP4580118B2 |
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JP2010247261A |
To provide a brushing device and method easily performing polishing so that a proper pressing force of the brush is always made.The brushing device 1 for polishing a workpiece W by pressing a cup type brush 4 rotated by a brush rotation ...
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JP2010240747A |
To provide a simplified plastic lens polishing device capable of developing a stable polishing performance by efficiently supplying a polishing agent, suppressing the use amount of the polishing agent, and shortening a polishing time.Thi...
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JP2010214550A |
To provide a chamfering device of a prismatic silicon ingot having short throughput time and compact footprints.The prismatic silicon ingot (w) left with four circular-arc corner parts by slicing four surrounding sides is fixed (s1) in a...
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JP4554589B2 |
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JP4526987B2 |
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JP2010167518A |
To obtain a linear brush for use of a linear tool disk, which is mounted on the linear tool disk for high-speed rotating and reciprocating a linear tool and can accurately polish a highly fragile material such as rigid plastic.Both ends ...
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JP4516509B2 |
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JP4508982B2 |
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JP2010522093A |
Methods of abrading surfaces by rotationally reciprocating abrasive surfaces in contact with the surfaces, abrasive articles for use in rotationally reciprocating tools, and methods of removing defects in a surface, where the methods inc...
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JP4488799B2 |
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JP2010131695A |
To accurately polish a disk, particularly the inner peripheral end surface thereof, using a single polishing member. When the disk material is polished, a polishing brush having brush bristles whose front ends are flat is used. While a p...
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JP4469266B2 |
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JP4464973B2 |
A molded brush segment having a plurality of integrally molded bristles extending from a generally planar center portion. The brush segment is molded from a moldable polymer, such as a thermoplastic elastomer, and has a plurality of abra...
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JP4460736B2 |
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JP2010080026A |
To reduce quality variation of an outer peripheral end part and an inner peripheral end part of a substrate for a magnetic disk between processing batches.The method for manufacturing the substrate for the magnetic disk includes an end s...
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JP4440621B2 |
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JP4432177B2 |
To provide a cloth for polishing a magnetic disk allowing texture machining of uniform surface roughness Ra regardless of size of grains. At least weft comprises crimped threads mainly made of polyester extra fine filament fiber with sub...
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JP4432178B2 |
To provide a cloth for polishing a magnetic disk allowing polishing machining of more uniform and fine surface rughness Ra, by reducing a meandering phenomenon during texture machining. Warp mainly comprises polyester filament fiber, and...
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JP2010042502A |
To provide a method of machining for forming a sliding surface on a cylinder wall of a cylinder liner of a piston type combustion engine, in particular low-speed large diesel engine of the two stroke type, where a piston is arranged in a...
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JP2010042534A |
To provide a tire inner face treating method capable of polishing properly a tire inner face, and a tire inner face treating device capable of executing the treating method.The tire inner face treating method polishes the tire inner face...
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JP2010023205A |
To provide a polishing method for a work capable of stabilizing a polishing shape, for example, a radius R of curvature of an end edge of a work such as a metal ring adopted for CVT (Continuously Variable Transmission) even if the number...
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JP4405037B2 |
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JP4398160B2 |
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JP4398081B2 |
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JP4394673B2 |
A semiconductor processing system, such as a system for scrubbing both sides of a wafer at the same time, that includes a brush box containment apparatus for use with highly-acidic or other volatile chemical solutions, a roller positioni...
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JP3156265U |
To surely mirror-polish to the depth of a groove formed by an adjacent chamfered portion by reducing the polishing amount of the end face and increasing the polishing amount of the chamfered portion, and keep the chamfered portion angle ...
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JP2009291908A |
To avoid various adverse effects such as the occurrence of warpage, degrading of quality by hit marks, and increase in the time required for polishing operation for a sheet-like workpiece when one side of the sheet-like workpiece is poli...
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JP2009291907A |
To avoid various adverse effects that may be caused if a method is adopted which is devised by the inventor and the like and polishes both sides of a sheet-like workpiece simultaneously by a pair of buffing rollers.This polishing apparat...
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JP4385331B2 |
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JP4383354B2 |
Disclosed is a grinding tool for a grinder comprising a rotary oscillating drive, the output shaft of which is driven so as to oscillate back and forth about its longitudinal axis and is configured for securing the grinding tool thereon....
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JP4365248B2 |
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JP4360950B2 |
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JP2009248264A |
To provide a polishing member for polishing the outer surface, inner surface, and corner sections of a workpiece and the portions thereof where burrs are generated.This polishing member polishes the outer surface and/or the inner surface...
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JP4351697B2 |
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JP4354769B2 |
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JP2009241185A |
To provide a polishing apparatus for a trolley wire capable of securing a safety of a work, by performing a polishing work of a trolley wire of a ceiling crane in a short time period and eliminating a work at a high place.A pair of cable...
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JP4348239B2 |
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JP4348089B2 |
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JP2009226570A |
To properly feed a polishing fluid to the portions of a plurality of substrates for magnetic recording medium each having a round hole at the center to be polished when the substrates are stacked and the inner peripheral end surfaces of ...
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JP4339512B2 |
The present invention relates to an abrasive article. The abrasive article of the present invention contains an abrasive layer, a polyurethane structure bonded to the abrasive layer and a substrate bonded to the polyurethane structure. T...
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JP4332145B2 |
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JP4319725B2 |
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JP2009184093A |
To provide a continuous polishing device capable of preventing clogging of a polishing pad and improving polishing efficiency.In the polishing device for continuously polishing a traveling substrate using a polishing head rotating around...
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JP4317058B2 |
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