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JP2001148386A |
To obtain a method for flattening Cu and a Cu alloy with high efficiency using CMP(chemical mechanical polishing) by removing corrosion or suppressing corrosion and removing dishing and a defect or suppressing them. First, accumulated Cu...
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JP2001138250A |
To prevent bristles of a brush from rupturing during the service. A grinding tool 1A is structured so that a brush holder 20A made of resin to hold bristles of a columnar brush 30 is mounted on a shank 10A made of metal.
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JP2001138253A |
To prevent a metal wire from severance as much as practicable even during machining. A grinding tool 1 according to the present invention is configured so that a plurality of thin wires 20 of metal having ridges 21 are arranged so that t...
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JP3169294B2 |
PURPOSE: To prevent overpolishing of the end surface of a tube and, at re- starting, return a brushing device stably and accurately without producing pushing-out by providing a quick retreating function and a slow returning function on t...
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JP2001126444A |
To provide a disk mounting structure capable of reliably preventing polishing powder, etc., from entering a gap between layers of a DVD and effectively suppressing generation, etc., of a radial crack caused by the difference of temperatu...
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JP2001121398A |
To prevent the damage of a machined object caused by contact with the tip part of a core material. In this grinding tool with a twisted brush 10 formed around a core material 20, a cap member 40 planted with cap brush hair 42 is provided...
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JP2001121389A |
To provide a deburring machine capable of uniformly and efficiently removing burrs over the whole width of a workpiece even in the case of the thickness of the workpiece being nonuniform in the width direction of a conveying path or the ...
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JP2001120827A |
To provide a polishing cloth clamping device surely fixing a polishing cloth without causing any damage to the polishing cloth and to provide a game ball lifting and polishing device using this clamping device. This polishing cloth clamp...
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JP2001121399A |
To provide a grinding tool capable of grinding even a machined hole not extending linearly. A brush unit 30 is held to a core member 20 formed of metal wires spirally twisted and bound so as to be freely curved in response to external fo...
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JP3160841B2 |
To satisfactorily polish an annular recess between disks, to surely remove abrasives or the like in an inner and outer circumferential surfaces, and conduct uniform and smooth brush polishing of high quality without impairing working acc...
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JP2001105296A |
To provide an abrasive pad capable of shortening the working time while providing the sufficient smoothness of a surface to be polished without conforming to the existence of fine irregular parts of the surface to be polished having a th...
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JP3157172B2 |
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JP3155017B2 |
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JP3154275B2 |
PURPOSE: To reduce a removal quantity of an anodic oxide coating layer so as to prevent color fading due to dyeing/coloring reagent treatment by previously polishing an aluminum material so as to form a smooth surface. CONSTITUTION: An a...
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JP2001088004A |
To obtain a treatment surface activated in a short treatment time while generating no damage on the surface of a base material and maintaining high surface accuracy in performing surface treatment on a seal surface to make metal surfaces...
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JP2001088039A |
To eliminate variation of the contact area of working with respect to asynmmetric free curved surface so as to make uniform the elimination deepness without changing the shape for improving the surface roughness. At least a portion to be...
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JP2001080940A |
To obtain the subject product by a processing method safe at work and environment-friendly by performing physical processing to make the surface roughness of the product after processed in a specified range. Particularly sandblast proces...
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JP2001071274A |
To increase a polishing amount without increasing a contact pressure to a matter to be polished and to easily adjust the roughness of a polished surface of the matter to be polished, by erecting a number of hard metallic wires different ...
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JP2001071249A |
To polish the surface of a magnetic disk by pressing a polishing material onto the surface of the magnetic disk at a low pressure. This polishing device 1 has a lapping tape 3 polishing the surface of the magnetic disk 2; a tape supply m...
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JP2001038600A |
To prevent flying of ground/polished/cleaned scales by a roll brush from running wire rods and to regulate and set a grinding/polishing/cleaning position for various kinds of running rods different in the diameter of the roll brush in a ...
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JP2001025953A |
To polish the whole surface of a metallic body with a uniform polishing precision by providing a pressure contact member for pressing each abrasive belt to press the abrasive surface of each abrasive belt to each side surface of the meta...
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JP2001501030A |
A semiconductor processing system, such as a system for scrubbing both sides of a wafer at the same time, that includes a brush box containment apparatus for use with highly-acidic or other volatile chemical solutions, a roller positioni...
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JP2001009739A |
To ensure an excellent surface finish with one type of brush by changing the brushing pressure in dependence on machined places.This brush has annularly bound hard drawn steel wires 12 over which CBN abrasive grains 13 are electrodeposit...
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JP3124276B1 |
A disk cleaner includes a polishing member that is rotated while it is pressed against a surface of a disk to be polished to thereby polish the surface of the disk and an air cooling apparatus that cools the disk by causing outside air t...
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JP3120571B2 |
PURPOSE: To provide a surface polishing device for a panel for in-line type cathode-ray tube in which surface polishing efficiency for the panel and durability of the device are improved and polishing quality is favorable. CONSTITUTION: ...
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JP2000351960A |
To obtain an abrasive grain body having improved polishing performances and polishing efficiency, having a phase change temperature from a fluid grindstone to a solid grindstone in a temperature range suitable for practical use, capable ...
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JP2000343419A |
To grind a workpiece face to conventional quality without using slurry containing diamond abrasive grain as an abrasive powder by grinding it using a rubber wheel containing abrasive powder so as to reduce a manufacturing cost and runnin...
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JP3116343B2 |
PURPOSE: To provide a glass non-woven cloth base epoxy resin laminate for a material supporting an item to be ground which can position the material supporting the item to be ground with good accuracy on an automatic grinding line. CONST...
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JP3112195B2 |
PURPOSE: To inexpensively mass-produce a polished ferritic stainless steel sheet having attractive metallic luster and excellent in oxidation resistance. CONSTITUTION: The polished steel sheet can be produced by subjecting a ferritic sta...
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JP3113088B2 |
PURPOSE: To provide a buff polishing device capable of buff-polishing a thin plate work without producing buckling. CONSTITUTION: Multiple buff polishing rollers 12 are fixed detachably on a drivingly rotated shaft 13 at specified interv...
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JP2000317807A |
To provide an apparatus for removing return protrusions from a shape steel, which is capable of effectively removing return protrusions formed on an edge portion of the shape steel, by a simple mechanism construction. This removing appar...
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JP2000317831A |
To keep the pressing force to a polishing surface constant by controlling the pressing force of a disc sander according to the angle of the disc sander for pressing the disc sander to the polishing surface to polish a material to be poli...
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JP3110935B2 |
PURPOSE: To provide a polishing device suitable manufacture by rolling a metallic strip whose surfaces are flawless and which are excellent in surface quality in the rolling technique of the metallic strip. CONSTITUTION: In a roll polish...
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JP3108356B2 |
To facilitate the applying of wax at a location requiring glossing such as floor of an automobile or a building by providing a rotatively driven rotary coater and a wax container to feed liquid wax in the wax container forcibly to the ro...
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JP2606408Y2 |
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JP3107160B1 |
[wrap up] [Task] In the present invention, the surface of the stainless steel strip is smoothed by using a smoothing roll facility suitable for crushing the convex portion of the polished grain generated by polishing to a lower level, in...
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JP2000301089A |
To obtain a simple and inexpensive treating means capable of continuously executing in turn the finish polishing treatment for improving the roughness of a planar workpiece and later washing treatment and drying treatment in one line. Th...
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JP3103456B2 |
PURPOSE: To provide a flat plate polishing method in which any color shade, irregular engraving, uneven plating, etc., do not occur on products, and also polishing speed is high. CONSTITUTION: A pair of front and rear flat plate polishin...
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JP2000294714A |
To prevent quality fluctuation caused by manual work and improve its productivity in deburring a resin-sealed lead frame. A plurality of resin-sealed lead frames 1 are arranged and fixed by fixing plates 2, a brush 3 rotated by a motor 6...
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JP2000289366A |
To improve stainless property at printing under a state the difficulty to get caught and a plate wearability at the printing of the support for a planographic printing plate are maintained favorably. Since a plurality of stages of grindi...
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JP2000288906A |
To provide a device and a method for polishing, capable of providing uniform surface finishing without reducing workability or bringing about inconveniences such as increased facility costs. A buff polisher 1 is provided with a pedestal ...
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JP2000287900A |
To provide a floor cleaner pad holder to improve the cleaning ability of a cleaner pad and to make the cleaner pad applicable to an existing floor cleaning device sold at a market. The doughnut-shaped holder main body 1 of this floor cle...
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JP3097913B1 |
A mirror-finishing method embodying this invention, with which the above and other objects can be accomplished, may be characterized as comprising the step of supplying a solution containing hydroxyl groups on a target surface to be poli...
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JP3094210B2 |
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JP2000271851A |
To form no polishing line in a preliminary polishing and prevent inferior sand dressing in the polishing by setting the mean grain size contained in a nonwoven fabric to a prescribed value or less and the maximum grain size to a prescrib...
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JP2000271539A |
To inhibit see-through of an intercoat while a coated face is prevented from being ground unevenly when foreign matter on the coated face is removed. A blade tool 3 such as a cutter blade or the like is provided in a holder 2 wherein one...
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JP3094355B2 |
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JP3091874B2 |
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JP3091739B1 |
[wrap up] [Task] Provided is an automatic polishing device capable of polishing not only when the polishing surface is horizontal but also when it is vertical or curved. The rotating abrasive 11, the arm 12 that holds the abrasive, the s...
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JP3091417B2 |
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