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WO/2006/129489A1 |
Any matter of chemical liquid, metal, etc. adhering to the surface of a member as a constituent of vacuum treatment apparatus, such as a vacuum vessel, is removed without the use of highly dangerous nitric acid, etc. There is provided a ...
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WO/2006/120181A2 |
The invention relates to a method to reduce the amount of dust formation of metal oxide particles. The method comprises the step of mixing metal oxide particles with an aqueous solution of an alkali metal silicate to form a metal oxide-a...
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WO/2006/117035A1 |
The invention relates to an electrolytic cell comprising a device provided with at least two cuboidal/column-shaped/prismatic chambers having identical cross-sections and made of a thermoplastic, mechanical resistant, electrical resistan...
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WO/2006/119058A1 |
This invention provides membrane-mediated electropolishing (MMEP) processes for polishing and/or planarizing metal work pieces using topographically patterned membranes. The processes can be used for both pure metals and alloys, and prov...
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WO/2006/100949A1 |
An aluminum plate (1) having an aluminum purity of not less than 99.98% by mass and an Fe content of 5 to 50 ppm with the balance consisting of unavoidable impurities is used to realize increased capacitance of an aluminum electrolytic c...
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WO/2006/094657A1 |
According to the invention, the etching of, for example, conductor structures on circuit boards (21) with etching fluid may be improved, whereby the etching fluid is sprayed onto the circuit board (21) as an aerosol spray (17), or simila...
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WO2006071745B1 |
A method and apparatus separates recoverable components (210) from conductive matrix composites (200) for further use or reuse. In an embodiment, the process uses an electrochemical apparatus that includes a cathode (220) and an anode. T...
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WO/2006/091285A2 |
An apparatus for cleaning objects using plasma is disclosed. The apparatus includes a first plurality of elongated dielectric barrier members arranged adjacent each other; a second plurality of elongated dielectric barrier members arrang...
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WO/2006/085881A1 |
An elevator load bearing member assembly includes at least one traction enhancing surface (46) on a jacket (44). In one example, a mechanical removal process is used to strip away at least some of an amide-rich layer from the surface (46...
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WO/2006/081470A1 |
Polishing compositions and methods for removing conductive materials and barrier materials from a substrate surface are provided. Polishing compositions are provided for removing at least a barrier material from a substrate surface by a ...
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WO/2006/081446A1 |
Polishing compositions and methods for removing conductive materials from a substrate surface are provided. In one aspect, a composition is provided for removing at least a conductive material from a substrate surface including one or mo...
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WO/2006/078734A2 |
An apparatus and method for cleaning objects using plasma are disclosed. The apparatus provides a plurality of elongated dielectric barrier members arranged adjacent each other; a first set of electrodes arranged to be coupled to a volta...
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WO/2006/078888A2 |
A method and apparatus for cleaning and surface conditioning objects using plasma are disclosed. One embodiment of the method discloses providing a plurality of elongated dielectric barrier members arranged adjacent each other, the elong...
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WO/2006/078894A2 |
A method and apparatus for cleaning and surface conditioning objects using plasma is disclosed. One embodiment of the method discloses providing a plurality of elongated dielectric barrier members arranged adjacent each other, the member...
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WO/2006/068660A2 |
A method and apparatus separates recoverable components (210) from conductive matrix composites (200) for further use or reuse. In an embodiment, the process uses an electrochemical apparatus that includes a cathode (200) and an anode. T...
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WO/2006/068283A1 |
A flattening method can flatly process a surface of a metal film as an interconnect material over the entire film surface at a sufficiently high processing rate even when the metal film has initial surface irregularities. The flattening ...
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WO/2006/068300A1 |
An aluminum material for electrolytic capacitor electrodes, wherein, in an alloy composition, the aluminum material contains Ga: 0.0005 mass% or more, and wherein a ratio AGa/BGa of Ga content AGa (mass%) in a surface layer ranging from ...
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WO/2006/057713A2 |
A polishing pad includes a guide plate having a plurality of holes therein and being affixed to a compressible under-layer; and a plurality of conducting polishing elements each affixed to the compressible under-layer and passing through...
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WO/2006/056367A1 |
A device is provided to clean an object by positioning the surface of the object to be cleaned in contact with a cleaning medium comprising one or more liquids having a dielectric constant of from 1 to 200 and placed in an electric field...
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WO/2006/046058A2 |
A method of forming a plurality of optical microstructures is disclosed. The method includes laser machining a plurality of holes onto a surface and electrolytically polishing at least the holes to remove debris created during the laser ...
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WO/2006/042985A1 |
The invention concerns a device for chemically etching an electrically conductive layer (2) on a transparent substrate (1), comprising means for supporting (4) the substrate (1) and means for spraying (5) a solution. The invention is cha...
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WO/2006/037584A1 |
The present electropolishing electrolyte comprises an acid solution and an alcohol additive having at least one hydroxy group, wherein the contact angle of the alcohol additive is smaller than the contact angle of the acid solution on a ...
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WO/2006/030998A1 |
Disclosed are an electro polishing combined electric plating apparatus and an electroless plating apparatus using the same that that can form a plating film on a workpiece shaped in a pipe made of a material selected from the group consi...
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WO/2006/029708A1 |
The invention relates to a method for creating structures or microstructures on metallic surfaces by means of electrochemical etching. The invention further relates to components that are processed according to such a method.
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WO/2006/013812A1 |
A process for producing an aluminum electrode foil for a capacitor, comprising a first step of preparing an emulsion from a mixture containing a first phase of a liquid resin or a resin solution of a resin dissolved in a solvent, a secon...
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WO/2006/010888A1 |
A method of depositing or etching a micro- or nano- scale pattern on a work-piece is disclosed, comprising the steps of: (a) placing the work piece in an electrochemical reactor in close proximity to a patterned tool; (b) connecting the ...
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WO/2006/008017A1 |
The invention relates to a method and device for electrolytically descaling flat metal products (2), particularly strips of stainless steel and or C-steel. At least one diamond electrode and /or at least one lead/tin electrode, e.g. a le...
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WO/2006/008371A1 |
The invention relates to a method for continuously producing an aluminium alloy strip for transferring a sublimable decoration from a temporary carrier consisting in using the aluminium alloy strip having a gloss and high-gloss quality, ...
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WO/2006/002610A1 |
The invention relates to a method for removing coatings which are applied to components, such as turbine blades. When the turbine blades have reached the end of the product life cycle, said coatings can be removed so that the turbine bla...
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WO/2006/000301A1 |
The invention relates to a device for the electrochemical surface treatment of metal parts in an electrolyte bath (B). The device comprises a drum (12) which is rotatable about an axis (X) and provided with a shell (14) and sidewalls (16...
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WO/2006/001699A1 |
The present invention relates to a method of improving the current efficiency (CE) in an electrolytic aluminium production cell with an electrolytic bath, at least one anode and at least one cathode, and passing current between said anod...
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WO/2005/123317A1 |
A method and apparatus for the removal of a deposited conductive layer along an edge of a substrate using an electrode configured to electro polish a substrate edge are disclosed. The electro polishing of the substrate edge may occur sim...
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WO/2005/120743A1 |
The invention concerns a method comprising: a) providing sheet or format metal; b) swaging said metal by means of a swaging lubricant, so as to form a swaged blank (1); c) degreasing said swaged blank (1), so as to typically remove the r...
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WO/2005/113863A2 |
The invention provides a cylindrical electrochemical cell which includes a first electrode and a second electrode which is a counter electrode to the first electrode, and an electrolyte. The first electrode includes a polyanion-based ele...
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WO/2005/108041A1 |
A method for cleaning a mold, wherein a main cleaning solution for use in the electrolytic cleaning as a main cleaning comprises a strongly alkaline component containing one or more selected from sodium hydroxide, potassium hydroxide and...
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WO/2005/105356A2 |
A system for electrochemical mechanical polishing of a conductive surface of a wafer is provided. The system includes a wafer holder to hold the wafer and a belt pad disposed proximate to the wafer to polish the conductive surface. Appli...
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WO/2005/106081A1 |
The invention relates to a method for selectively coating or etching surfaces during which the surface areas that are not to be treated are masked with a masking device (18) during the actual coating or etching process. The masking devic...
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WO2005000363B1 |
The present invention relates to methods and apparatuses for the use of atmospheric pressure non-thermal plasma to clean and sterilize the surfaces of liquid handling devices.
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WO/2005/100643A2 |
The present invention relates to a process for production, shipment, and treatment of a NH4F(HF)x feedstock for local production of fluorine and NF3 for semiconductor chamber cleaning without the need for storage of large quantities of d...
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WO/2005/093135A1 |
An electrolytic processing apparatus (50) has feed electrodes (74) to feed a current to a substrate (W), an ion exchanger (76) brought into contact with the substrate (W), and process electrodes (72) to perform an electrolytic process on...
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WO/2005/090648A2 |
An electrolytic processing apparatus can maintain a difference in electric resistance between a recessed portion and a raised portion in the surface of a workpiece, thereby providing a processed surface with improved flatness. The electr...
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WO/2005/086192A1 |
Capacitor foil (10) having a core layer (11), at least one porous layer (12; 13) and a porous surface layer (16; 17), and a method for producing the same and an electrolytic capacitor. The at least one porous layer (12; 13) and the porou...
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WO/2005/085502A1 |
The invention relates to a method for electrolytically pickling metallic bands, particularly stainless steel bands made of titanium, aluminum, chromium or nickel, during which the electrical current is conducted directly into the anode a...
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WO/2005/083159A2 |
This invention provides a membrane-mediated electropolishing apparatus for polishing and/or planarizing metal work-pieces. The work-piece is wetted with a low-conductivity fluid. The wetted work-piece is contacted with a first side of a ...
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WO/2005/082057A2 |
A metal layer formed on a wafer, the wafer having a center portion and an edge portion, is electropolished by aligning a nozzle and the wafer to position the nozzle adjacent to the center portion of the wafer. The wafer is rotated. As th...
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WO/2005/083158A1 |
The invention relates to a method for electrochemically removing a coating from components, especially gas turbine components. According to said method, the component from which the coating is to be removed is connected to a positive ter...
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WO/2005/078751A1 |
A method for manufacturing an aluminum material for electrolytic capacitor electrodes of the present invention, comprising the steps of heating an aluminum material in an oxidative atmosphere, removing the surface layer of the aluminum m...
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WO/2005/075711A1 |
Polishing compositions and methods for removing conductive materials from a substrate surface are provided. In one aspect, a composition is provided for removing at least a conductive material from a substrate surface including sulfuric ...
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WO/2005/075712A2 |
An improved electrochemical IR calculation and correction system allows for the precise measurement and control of the interfacial voltage drop at an electrode double layer. In an exemplary use of the invention, this improved IR correcti...
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WO/2005/071142A1 |
A method and apparatus for stripping electro-deposited metal sheets from a cathode blank. The blank (14) has opposite faces (16) and (18), upstream and downstream ends. The apparatus comprises a stripping assembly (30) for stripping th...
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