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JP6224114B2 |
The invention relates to a semi-transparent photocathode (1) for a photon detector having an increased absorption rate for a preserved transport rate. According to the invention, the photocathode (1) includes a transmission diffraction g...
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JP2017195172A |
To provide a stable filament assembly utilized in applications requiring generation of electrons, which may contribute to increasing the filament life and may enhance the stability of an electron stream.A filament assembly 200 includes a...
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JP6212327B2 |
An improved cathode comprises a cone-shaped emitter with a carbon-based coating applied to the emitter cone surface, in which there is a narrow annular gap between the emitter body and the carbon coating. The gap prevents direct contact ...
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JP2017183213A |
To constitute an electron gun of higher luminance than before.Luminance of electron gun is increased by using a high melting point metal (701) of 1900K or more, starting with rhenium, as the base of electron gun, storing boron (802) in a...
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JP6206541B1 |
[Subject] Property modification processing of a guard electrode etc. can be performed controlling electric field radiation of an emitter, and it contributes to improvement in the characteristic of an electric field radiation device. [Mea...
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JP6208371B2 |
The invention relates to a cathode arrangement comprising: a thermionic cathode comprising an emission portion provided with an emission surface for emitting electrons, and a reservoir for holding a material, wherein the material, when h...
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JP6206546B1 |
[Subject] Property modification processing of a guard electrode etc. can be performed controlling electric field radiation of an emitter, and it contributes to improvement in the characteristic of an electric field radiation device. [Mea...
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JP6200175B2 |
A semiconductor photocathode includes an Al X Ga 1-X N layer (0 ¤ X < 1) bonded to a glass substrate via an SiO 2 layer and an alkali-metal-containing layer farmed on the Al X Ga 1-X N layer. The Al X Ga 1-X N layer includes a first r...
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JP6192097B2 |
To provide "a photo cathode type electron beam source, a manufacturing method thereof, and a photo cathode type electron beam source system", capable of generating electron beams with dramatically high luminance as compared with conventi...
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JP6187436B2 |
An electron emission device includes a substrate and an electron emission layer. The electron emission layer is provided above the substrate, and is provided with an opening. The electron emission layer has an edge defining the opening a...
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JP2017143011A |
To provide an electron-emitting element capable of suppressing leakage current.An electron-emitting element including a pair of electrodes placed oppositely to each other, where electrons move between the pair of electrodes, further incl...
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JP6181963B2 |
An electron emitting device includes a lower electrode, a surface electrode, an electron acceleration layer between the lower electrode and the surface electrode, and an electrode selecting unit. The electron acceleration layer is made o...
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JP2017522056A |
A device and an application method for repairing oxidative damage of DNA are provided. It consists of an electron emission unit, an electron source, a control system, a power supply, and a holder. The device emits electrons into a range ...
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JP6158798B2 |
A method for manufacturing of a device (300, 410-412) comprising a first substrate (201) comprising a plurality of sets of nanostructures (207) arranged on the first substrate, wherein each of the sets of nanostructures is individually e...
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JP2017107816A |
To provide a filament for thermal electron emission capable of securing long life, and to improve the analysis accuracy of a mass spectrometer that includes the filament for thermal electron emission.A filament 211 for thermal electron e...
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JP6131437B2 |
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JP6115638B2 |
An X-ray tube assembly for generating an X-ray, comprises: a filament including a plurality of electric flow paths; and an adjustor configured to adjust at least one of values of current flowing through the plurality of electric flow pat...
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JPWO2015141015A1 |
Basically, it operates with low-energy particles that suppress the influence on the SN ratio by making the particle moving part of these particles a pseudo-one-dimensional structure between the particle emission / absorption sources incl...
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JP2017510051A |
The exemplary embodiments given in the present application are intended for X-ray generating devices. The device comprises at least one electron emitter (22, 22_1, 22_2, 22_3) having a conductive substrate (23). The conductive substrate ...
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JP2017045639A |
To provide a metal-insulator-metal (MIM) type electron emission element with high electron emission efficiency.An electron emission element 20 comprises a lower electrode layer 21, an insulator layer 22, and an electron permeable electro...
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JPWO2015019607A1 |
Provided is an anisotropic conductor membrane that can be manufactured without requiring complicated process control. The anisotropic conductor film (1) is a pore structure (21) made of an anodized metal film having a plurality of throug...
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JP6087961B2 |
An electron beam sterilizing device comprises an electron-generating filament, a grid connected to a voltage source, a beam shaper, and an output window. A high voltage source generates a high voltage potential between the electron-gener...
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JP6078576B2 |
A field emission electron source includes a linear carbon nanotube structure, an insulating layer and at least one conductive ring. The linear carbon nanotube structure has a first end and a second end. The insulating layer is located on...
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JP6075213B2 |
To provide a flat-plate emitter having such a shape that can be easily incorporated in an electron source for an X-ray tube or other application with good positional accuracy, and that is difficult to deform an electron beam emitting sur...
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JP2017022051A |
To provide an impregnation type cathode body structure which prevents first and second reflectors or an insulation material from being deteriorated.A support inner cylinder 23 and a support outer cylinder 24 are provided on a rear face 1...
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JP6062192B2 |
To improve processability of mayenite-based materials.A mayenite composite material contains (A) an oxide and (B) a metal binder. The (A) oxide has electron conductivity and a mayenite structure, and is represented by the general formula...
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JP2016225358A |
To provide a method of selecting a cathode that does not cause abnormality in the peripheral portion of an electron emission surface.The method comprises a step S110 of using a measurement target cathode whose electron emission surface i...
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JP2016207281A |
To provide a cathode body structure for electron tube capable of improving the rapid mobility.A cathode body structure for electron tube includes a cathode for emitting electrons, a heater for heating the cathode, a heater support member...
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JP2016207319A |
To provide an electric field emission electron source in which a hexaboride single crystal having stable electron emission characteristics is used and electron emission performance is improved with a more simple structure.An electric fie...
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JP6038794B2 |
A field-emission electron gun including an electron emission tip, an extractor anode, and a mechanism creating an electric-potential difference between the emission tip and the extractor anode. The emission tip includes a metal tip and a...
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JP6027583B2 |
An ion filter used for an electron multiplier is provided. The ion filter has an insulating substrate (11), a first conductive layer (12) formed on one main surface of the insulating substrate (11), a second conductive layer (13) formed ...
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JP6028277B2 |
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JP6018386B2 |
To provide a compact electron beam irradiation device in which throughput of an electron beam exposure device is enhanced.The electron beam irradiation device outputing a plurality of electron beams includes a surface electron beam sourc...
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JP6016475B2 |
To provide an electron emission element capable of stably emitting electrons in an atmospheric air and in a vacuum without causing warpage of an electrode and peeling of a thin film.An electron emission element of the present invention i...
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JP6008594B2 |
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JP6001319B2 |
To realize a spin polarization electron generating element having a high spin polarization degree and high external quantum efficiency.There is provided a spin polarization electron generating element in which a substrate is GaP, a buffe...
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JP5994271B2 |
To provide an electron beam generator which improves the parallel degree improving throughput of an electron beam exposure device.An electron beam generator includes: a substrate provided with multiple holes; multiple electron emission p...
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JP5955713B2 |
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JP2016126993A |
To provide a carbon nanotube paste and a manufacturing method thereof.A carbon nanotube paste comprises: first nanopowder of an insulative refractory; second nanopowder of a metal oxide; solvent to disperse the first nanopowder and the s...
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JP2016126958A |
To provide an anisotropic conductive film capable of improving electron emission performance when used as an FE device or the like.An anisotropic conductive film 1 comprises a pore structure 21 composed of an anode oxide metal film havin...
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JP2016126959A |
To provide an anisotropic conductive film comprising a pore structure composed of an anode oxide metal film having a plurality of through holes and a conductor selectively formed inside some of the plurality of through holes, and capable...
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JP2016126960A |
To provide an anisotropic conductive film comprising a plurality of needle-like conductors including a carbon nanotube, and capable of orienting the plurality of needle-like conductors including the carbon nanotube almost vertically and ...
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JP5943321B2 |
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JP5926750B2 |
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JP5926709B2 |
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JP5924515B2 |
To provide a new nano/micro projection body that is expected to be applied to a catalyst and various electronic purposes, and to provide a method for producing the projection body.The nano/micro projection body is formed and grown, on a ...
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JP2016091851A |
To provide an electric field focusing type electron source array capable of preventing an electron emission source from being broken down.In an electric field focusing type electron source array that is controlled by X-Y matrix wiring, a...
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JP5914909B2 |
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JP2016065271A |
To provide a filament for fixing device, excellent in strength and durability which copes with external force such as impact or vibration even after recrystallization.The filament for fixing device is a filament used for a fixing device,...
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JP5911576B2 |
Provided is a tungsten alloy part which comprises tungsten and at least two types of components selected from the group consisting of Zr, ZrO 2 , ZrC and C. This tungsten alloy part contains 0.1-5 wt% of Zr in terms of ZrO 2 .
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