Title:
CHARGED PARTICLE BEAM IRRADIATION DEVICE AND METHOD OF REDUCING ELECTRIC CHARGE BUILD-UP ON SUBSTRATE
Document Type and Number:
Japanese Patent JP2019062069
Kind Code:
A
Abstract:
To provide a device which can reduce an electric charge build-up or/and remove a contaminant without affecting a magnetic field generated by an electromagnetic lens included in an original charged particle beam optical system of a device for radiating a charged particle beam.SOLUTION: The irradiation device 100 comprises: an electron gun 201 for launching an electron beam; an objective lens 207 for refracting the electron beam; a plurality of electrodes 220, 222, 224, 226 which are disposed in a magnetic field space of the objective lens 207 so as to surround a space outside an electron beam passing region; and an electric potential control circuit 124 which generates plasma in the space surrounded by the plurality of electrodes, and controls an electric potential of the plurality of electrodes so as to control the movement of a positive ion or an electron and a negative ion which are produced by the plasma. In the irradiation device, a positive ion, an electron and a negative ion, or active species are emitted from the space of the plasma.SELECTED DRAWING: Figure 1
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Inventors:
OGASAWARA MUNEHIRO
Application Number:
JP2017185151A
Publication Date:
April 18, 2019
Filing Date:
September 26, 2017
Export Citation:
Assignee:
NUFLARE TECHNOLOGY INC
International Classes:
H01L21/027; G03F7/20; H01J37/20
Domestic Patent References:
| JPH04336421A | 1992-11-24 | |||
| JPH0688225A | 1994-03-29 | |||
| JPH07176290A | 1995-07-14 | |||
| JPH08190887A | 1996-07-23 | |||
| JP2003031175A | 2003-01-31 | |||
| JP2003115276A | 2003-04-18 | |||
| JP2003173757A | 2003-06-20 | |||
| JP2007149449A | 2007-06-14 |
Foreign References:
| US20020088950A1 | 2002-07-11 |
Attorney, Agent or Firm:
Tetsuma Ikegami
Akira Sudo
Mitsuyuki Matsuyama
Akira Sudo
Mitsuyuki Matsuyama