Title:
METHOD FOR MANUFACTURING FILM CONTAINING INDIUM OXIDE AND METHOD FOR MANUFACTURING FIELD EFFECT TRANSISTOR
Document Type and Number:
Japanese Patent JP2019165040
Kind Code:
A
Abstract:
To provide a method allowing to form a continuous film without cracks even when forming an oxide film using a coating solution, thereby obtaining an oxide film that exhibits useful conductive properties.SOLUTION: The method for producing a film containing indium oxide on a to-be-coated object includes heating a coating solution after coating the coating solution on the to-be-coated object. The coating solution contains at least indium nitrate and a solvent. An air velocity of an airflow on a surface of the coating solution applied on the to-be-coated object when heating is 0.4 m/s or more.SELECTED DRAWING: None
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Inventors:
ABE YUKIKO
ANDO YUICHI
NAKAMURA YUKI
MATSUMOTO SHINJI
SONE YUJI
UEDA NAOYUKI
SAOTOME RYOICHI
NIIE SADANORI
KUSAYANAGI MINEHIDE
ANDO YUICHI
NAKAMURA YUKI
MATSUMOTO SHINJI
SONE YUJI
UEDA NAOYUKI
SAOTOME RYOICHI
NIIE SADANORI
KUSAYANAGI MINEHIDE
Application Number:
JP2018050357A
Publication Date:
September 26, 2019
Filing Date:
March 19, 2018
Export Citation:
Assignee:
RICOH CO LTD
International Classes:
H01L21/368; H01L21/336; H01L29/786
Domestic Patent References:
| JP2011108527A | 2011-06-02 | |||
| JP2015111628A | 2015-06-18 | |||
| JP2004039977A | 2004-02-05 | |||
| JP2010018696A | 2010-01-28 | |||
| JP2005217282A | 2005-08-11 | |||
| JP2004148193A | 2004-05-27 | |||
| JP2003179041A | 2003-06-27 |
Foreign References:
| WO2017159810A1 | 2017-09-21 | |||
| WO2016121230A1 | 2016-08-04 |
Attorney, Agent or Firm:
Koichi Hirota