Title:
MANUFACTURING METHOD OF INORGANIC PLATINUM COMPOUND
Document Type and Number:
Japanese Patent JP2020090430
Kind Code:
A
Abstract:
To provide a manufacturing method of a safe inorganic platinum compound with reduced environmental load by avoiding use of a chlorine gas, aqua regia or hydrogen peroxide in a process.SOLUTION: A process (A): a process for preparing a platinum material and a halogen-containing oxidant, and a process (B): a process for treating the platinum material with the halogen-containing oxidant in a hydrochloric acid solution to obtain an inorganic platinum compound, the inorganic platinum compound contains platinum chloride acid or platinum chloride salt, the halogen-containing oxidant is other than chlorine gas. For example by adding a solution consisting of a hydroiodic acid, hydrochloric acid and water to a mixture of a platinum powder and condensed hydrochloric acid solution, conducting a heating reaction, then reducing pressure and concentrating and cooling them, a crystal of chloroplatinic acid hexahydrate can be obtained at yield of over 99%.SELECTED DRAWING: None
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Inventors:
LU LIN
FANG JIM-MIN
CHIU CHUN-LUN
YEN HAN-WU
PENG CHI-JIUN
WANG CHENG-DING
FANG JIM-MIN
CHIU CHUN-LUN
YEN HAN-WU
PENG CHI-JIUN
WANG CHENG-DING
Application Number:
JP2019039996A
Publication Date:
June 11, 2020
Filing Date:
March 05, 2019
Export Citation:
Assignee:
TRIPOD NANO TECH CORP
International Classes:
C01G55/00
Domestic Patent References:
| JPS4979395A | 1974-07-31 | |||
| JP2014173107A | 2014-09-22 | |||
| JP2017157664A | 2017-09-07 | |||
| JP2016011449A | 2016-01-21 | |||
| JP2014043611A | 2014-03-13 |
Foreign References:
| WO2007080963A1 | 2007-07-19 | |||
| US4941917A | 1990-07-17 |
Attorney, Agent or Firm:
Hajime Amano