Title:
ネガ型感光性シロキサン組成物
Document Type and Number:
Japanese Patent JP6513399
Kind Code:
B2
Abstract:
To provide a negative-working photosensitive siloxane composition developable inorganically, and also to provide a cured film-manufacturing method employing that. The present invention provides a negative-working photosensitive siloxane composition comprising a polysiloxane, a silicon-containing compound having an ureido bond, a polymerization initiator, and a solvent. This composition is coat on a substrate, exposed to light, and developed, so that a cured film can be obtained without carrying out post-exposure baking.
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Inventors:
Yokoyama Taishi
Atsuko Notani
Yuji Tashiro
Takashi Yoshida
Yasuaki Tanaka
Takashi Fukuya
Takahashi Megumi
Katsuhito Taniguchi
Toshinori Nonaka
Atsuko Notani
Yuji Tashiro
Takashi Yoshida
Yasuaki Tanaka
Takashi Fukuya
Takahashi Megumi
Katsuhito Taniguchi
Toshinori Nonaka
Application Number:
JP2014509224A
Publication Date:
May 15, 2019
Filing Date:
April 05, 2013
Export Citation:
Assignee:
AZED Electronic Materials (Luxembourg) Societe a Responsible Limite
International Classes:
G03F7/075; H01L21/027
Domestic Patent References:
| JP201195432A | ||||
| JP2010266803A | ||||
| JP2004109409A | ||||
| JP2000258904A | ||||
| JP2007193318A |
Foreign References:
| WO2012026400A1 |
Attorney, Agent or Firm:
Hiroyuki Nagai
Yukitaka Nakamura
Yasukazu Sato
Satoru Asakura
Hideaki Maekawa
Endo Ayako
Yukitaka Nakamura
Yasukazu Sato
Satoru Asakura
Hideaki Maekawa
Endo Ayako